A New Process For Manufacturing Arrays Of Microlenses

N. P. Eisenberg; A. Karsenty; J. Broder; M. Abitbol; N.Ben Yossef

doi:10.1117/12.951075

5 July 1989 A New Process For Manufacturing Arrays Of Microlenses

N. P. Eisenberg, A. Karsenty, J. Broder, M. Abitbol, N.Ben Yossef

Proceedings Volume 1038, 6th Mtg in Israel on Optical Engineering; (1989) https://doi.org/10.1117/12.951075
Event: Sixth Meeting of Optical Engineering in Israel, 1988, Tel Aviv, Israel

Abstract

The need for microlenses with a wide-range of focal lengths from 10μ to 100mm and with a diameter varying from 10μ to 1mm lead to the development of various techniques which are able to generate these lenses in a photoresist substrate. The existing techniques are reviewed and a new one proposed. In this technique a positive or negative photoresist layer is exposed to a tailored light intensity distribution. After development of the photoresist, its surface is identical to the spatial intensity light distribution. Photoresist with an index of refraction of n=1.6 in the visible spectrum, can be used as a lens.

Citation Download Citation

N. P. Eisenberg, A. Karsenty, J. Broder, M. Abitbol, and N.Ben Yossef "A New Process For Manufacturing Arrays Of Microlenses", Proc. SPIE 1038, 6th Mtg in Israel on Optical Engineering, (5 July 1989); https://doi.org/10.1117/12.951075

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