7 September 2017 Metrology of variable-line-spacing x-ray gratings using the APS Long Trace Profiler
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Abstract
As resolving power targets have increased with each generation of beamlines commissioned in synchrotron radiation facilities worldwide, diffraction gratings are quickly becoming crucial optical components for meeting performance targets. However, the metrology of variable-line-spacing (VLS) gratings for high resolution beamlines is not widespread; in particular, no metrology facility at any US DOE facility is currently equipped to fully characterize such gratings. To begin to address this issue, the Optics Group at the Advanced Photon Source at Argonne, in collaboration with SOLEIL and with support from Brookhaven National Laboratory (BNL), has developed an alternative beam path addition to the Long Trace Profiler (LTP) at Argonne’s Advanced Photon Source. This significantly expands the functionality of the LTP not only to measure mirrors surface slope profile at normal incidence, but also to characterize the groove density of VLS diffraction gratings in the Littrow incidence up to 79°, which covers virtually all diffraction gratings used at synchrotrons in the first order. The LTP light source is a 20mW HeNe laser, which yields enough signal for diffraction measurements to be performed on low angle blazed gratings optimized for soft X-ray wavelengths. We will present the design of the beam path, technical requirements for the optomechanics, and our data analysis procedure. Finally, we discuss challenges still to be overcome and potential limitations with use of the LTP to perform metrology on diffraction gratings.
Conference Presentation
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Janet Sheung, Janet Sheung, Jun Qian, Jun Qian, Joseph Sullivan, Joseph Sullivan, Muriel Thomasset, Muriel Thomasset, Jonathan Manton, Jonathan Manton, Sunil Bean, Sunil Bean, Peter Takacs, Peter Takacs, Joseph Dvorak, Joseph Dvorak, Lahsen Assoufid, Lahsen Assoufid, } "Metrology of variable-line-spacing x-ray gratings using the APS Long Trace Profiler", Proc. SPIE 10385, Advances in Metrology for X-Ray and EUV Optics VII, 1038508 (7 September 2017); doi: 10.1117/12.2279053; https://doi.org/10.1117/12.2279053
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