Double multilayer monochromators for upgraded ESRF beamlines

Ch. Morawe; D. Carau; J.-Ch. Peffen

doi:10.1117/12.2273609

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23 August 2017 Double multilayer monochromators for upgraded ESRF beamlines

Ch. Morawe, D. Carau, J.-Ch. Peffen

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Proceedings Volume 10386, Advances in X-Ray/EUV Optics and Components XII; 1038603 (2017) https://doi.org/10.1117/12.2273609
Event: SPIE Optical Engineering + Applications, 2017, San Diego, California, United States

Abstract

Recently, several upgraded ESRF beamlines have become operational. Some of them include Double Multilayer Monochromators (DMM) to reduce the heat load on downstream optics or to benefit from increased flux compared to crystal optics. In some cases the bandwidth of the DMM has to stay below 0.5%. Such multilayers require an elevated number of layers, materials with moderate electron density, and a coating uniformity close to 0.1%. These boundary conditions impose severe constraints on the performance of the deposition system. This work will highlight successful results and discuss persisting issues and potential approaches for technical improvements.

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Ch. Morawe, D. Carau, and J.-Ch. Peffen "Double multilayer monochromators for upgraded ESRF beamlines", Proc. SPIE 10386, Advances in X-Ray/EUV Optics and Components XII, 1038603 (23 August 2017); https://doi.org/10.1117/12.2273609

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