23 August 2017 Aberration correction for hard x-ray focusing at the nanoscale
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Abstract
We developed a corrective phase plate that enables the correction of residual aberration in reflective, diffractive, and refractive X-ray optics. The principle is demonstrated on a stack of beryllium compound refractive lenses with a numerical aperture of 0.49 10-3 at three synchrotron radiation and x-ray free-electron laser facilities, where we corrected spherical aberration of the optical system. The phase plate improved the Strehl ratio of the optics from 0.29(7) to 0.87(5), creating a diffraction-limited, large aperture, nanofocusing optics that is radiation resistant and very compact.
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Frank Seiboth, Andreas Schropp, Maria Scholz, Felix Wittwer, Christian Rödel, Martin Wünsche, Tobias Ullsperger, Stefan Nolte, Jussi Rahomäki, Karolis Parfeniukas, Stylianos Giakoumidis, Ulrich Vogt, Ulrich Wagner, Christoph Rau, Ulrike Boesenberg, Jan Garrevoet, Gerald Falkenberg, Eric C. Galtier, Hae Ja Lee, Bob Nagler, Christian G. Schroer, "Aberration correction for hard x-ray focusing at the nanoscale", Proc. SPIE 10386, Advances in X-Ray/EUV Optics and Components XII, 103860A (23 August 2017); doi: 10.1117/12.2274030; https://doi.org/10.1117/12.2274030
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