23 August 2017 Aberration correction for hard x-ray focusing at the nanoscale
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We developed a corrective phase plate that enables the correction of residual aberration in reflective, diffractive, and refractive X-ray optics. The principle is demonstrated on a stack of beryllium compound refractive lenses with a numerical aperture of 0.49 10-3 at three synchrotron radiation and x-ray free-electron laser facilities, where we corrected spherical aberration of the optical system. The phase plate improved the Strehl ratio of the optics from 0.29(7) to 0.87(5), creating a diffraction-limited, large aperture, nanofocusing optics that is radiation resistant and very compact.
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Frank Seiboth, Frank Seiboth, Andreas Schropp, Andreas Schropp, Maria Scholz, Maria Scholz, Felix Wittwer, Felix Wittwer, Christian Rödel, Christian Rödel, Martin Wünsche, Martin Wünsche, Tobias Ullsperger, Tobias Ullsperger, Stefan Nolte, Stefan Nolte, Jussi Rahomäki, Jussi Rahomäki, Karolis Parfeniukas, Karolis Parfeniukas, Stylianos Giakoumidis, Stylianos Giakoumidis, Ulrich Vogt, Ulrich Vogt, Ulrich Wagner, Ulrich Wagner, Christoph Rau, Christoph Rau, Ulrike Boesenberg, Ulrike Boesenberg, Jan Garrevoet, Jan Garrevoet, Gerald Falkenberg, Gerald Falkenberg, Eric C. Galtier, Eric C. Galtier, Hae Ja Lee, Hae Ja Lee, Bob Nagler, Bob Nagler, Christian G. Schroer, Christian G. Schroer, } "Aberration correction for hard x-ray focusing at the nanoscale", Proc. SPIE 10386, Advances in X-Ray/EUV Optics and Components XII, 103860A (23 August 2017); doi: 10.1117/12.2274030; https://doi.org/10.1117/12.2274030

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