23 August 2017 Thickness uniformity study on the ESRF multilayer deposition system
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Abstract
The ESRF Multilayers Laboratory provides reflective optics in the X-ray domain using a deposition system where silicon substrates are coated with a well-defined multilayers stack. The multilayers period is used to tune the photon energy of the reflected X-ray beam. In some applications, the variation of the thickness profiles of the deposited materials must not exceed 0.1%. The aim of the study is to quantify the thickness uniformity of 1.2 m long single layer coatings with a spatial resolution of 10 mm or better. Results have been analyzed to identify potential sources of thickness variations. Investigations of long multilayers coatings complement this work.
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Damien Carau, Damien Carau, Jean-Christophe Peffen, Jean-Christophe Peffen, Christian Morawe, Christian Morawe, } "Thickness uniformity study on the ESRF multilayer deposition system", Proc. SPIE 10386, Advances in X-Ray/EUV Optics and Components XII, 103860V (23 August 2017); doi: 10.1117/12.2273273; https://doi.org/10.1117/12.2273273
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