6 July 1989 Ultrahigh-brightness XeCl laser system
Author Affiliations +
Proceedings Volume 1040, High Power and Solid State Lasers II; (1989) https://doi.org/10.1117/12.951185
Event: OE/LASE '89, 1989, Los Angeles, CA, United States
Abstract
A laser system that produces terawatt-level pulses of 308-nm light with near-diffraction-limited beam quality is under development. Pulses of 175-fs duration are generated at 616 nm in a synchronously-pumped mode-locked dye oscillator. These pulses are amplified in a three-stage dye amplifier longitudinally pumped by the frequency-doubled output of a regenerative Nd:YAG amplifier. Output of the dye amplifier is frequency-doubled in a BBO crystal and amplified in a chain of XeC1 excimer stages. The optical design maintains high beam quality throughout the system.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. B. Gibson, R. B. Gibson, T. R. Gosnell, T. R. Gosnell, C. S. Lester, C. S. Lester, J. P. Roberts, J. P. Roberts, C. R. Tallman, C. R. Tallman, A. J. Taylor, A. J. Taylor, } "Ultrahigh-brightness XeCl laser system", Proc. SPIE 1040, High Power and Solid State Lasers II, (6 July 1989); doi: 10.1117/12.951185; https://doi.org/10.1117/12.951185
PROCEEDINGS
4 PAGES


SHARE
Back to Top