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1 June 1989 Characterization Of Sputtering-Based Unheated CuI And AuI Lasers
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Abstract
In this paper we briefly describe the new room-temperature metal vapour laser in which a gas flow is used with a small sputtering cathode to produce a single shot, or low repetition rate, laser output on the CuI and AuI transitions. We summarise the results of studies made of the various aspects of the device physics including the sputtering and entrainment processes, the preionization of the metal vapour jet and the parametric dependences, and we discuss their implications for future development.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rod C. Tobin, Alfred K. Anders, Erol C. Harvey, and Stuart C. Rae "Characterization Of Sputtering-Based Unheated CuI And AuI Lasers", Proc. SPIE 1041, Metal Vapor Laser Technology and Applications, (1 June 1989); https://doi.org/10.1117/12.951227
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