28 September 2017 The role of model-based MPC in advanced mask manufacturing
Author Affiliations +
Proceedings Volume 10446, 33rd European Mask and Lithography Conference; 104460B (2017) https://doi.org/10.1117/12.2281894
Event: 33rd European Mask and Lithography Conference, 2017, Dresden, Germany
Abstract
This paper describes the use of model-based MPC in mask manufacturing for the 14 nm technology node and beyond, analyzes the requirements and challenges for introducing MPC and highlights its benefits in the mask manufacturing process.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ingo Bork, Ingo Bork, Peter Buck, Peter Buck, } "The role of model-based MPC in advanced mask manufacturing", Proc. SPIE 10446, 33rd European Mask and Lithography Conference, 104460B (28 September 2017); doi: 10.1117/12.2281894; https://doi.org/10.1117/12.2281894
PROCEEDINGS
7 PAGES


SHARE
Back to Top