28 September 2017 Machine learning for fab automated diagnostics
Author Affiliations +
Proceedings Volume 10446, 33rd European Mask and Lithography Conference; 104460O (2017) https://doi.org/10.1117/12.2280257
Event: 33rd European Mask and Lithography Conference, 2017, Dresden, Germany
Abstract
Process optimization depends largely on field engineer’s knowledge and expertise. However, this practice turns out to be less sustainable due to the fab complexity which is continuously increasing in order to support the extreme miniaturization of Integrated Circuits. On the one hand, process optimization and root cause analysis of tools is necessary for a smooth fab operation. On the other hand, the growth in number of wafer processing steps is adding a considerable new source of noise which may have a significant impact at the nanometer scale. This paper explores the ability of historical process data and Machine Learning to support field engineers in production analysis and monitoring. We implement an automated workflow in order to analyze a large volume of information, and build a predictive model of overlay variation. The proposed workflow addresses significant problems that are typical in fab production, like missing measurements, small number of samples, confounding effects due to heterogeneity of data, and subpopulation effects. We evaluate the proposed workflow on a real usecase and we show that it is able to predict overlay excursions observed in Integrated Circuits manufacturing. The chosen design focuses on linear and interpretable models of the wafer history, which highlight the process steps that are causing defective products. This is a fundamental feature for diagnostics, as it supports process engineers in the continuous improvement of the production line.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Manuel Giollo, Manuel Giollo, Auguste Lam, Auguste Lam, Dimitra Gkorou, Dimitra Gkorou, Xing Lan Liu, Xing Lan Liu, Richard van Haren, Richard van Haren, } "Machine learning for fab automated diagnostics", Proc. SPIE 10446, 33rd European Mask and Lithography Conference, 104460O (28 September 2017); doi: 10.1117/12.2280257; https://doi.org/10.1117/12.2280257
PROCEEDINGS
8 PAGES


SHARE
RELATED CONTENT


Back to Top