28 September 2017 Depth-profiling of vertical material contrast after VUV exposure for contact-free polishing of 3D polymer micro-optics
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Proceedings Volume 10446, 33rd European Mask and Lithography Conference; 1044613 (2017) https://doi.org/10.1117/12.2279712
Event: 33rd European Mask and Lithography Conference, 2017, Dresden, Germany
Abstract
We characterize the impact of high-energy, 172 nm vacuum ultraviolet photons on the molecular weight and the glass transition temperature of poly(methyl methacrylate). We found that the molecular weight is reduced strongly on the surface of the exposed samples with a continuous transition towards the unexposed bulk material being located below the modified region. The glass transition temperature was found to be significantly lowered in the exposed region to well below 50°C compared to that of the 122°C of the bulk region. We could use this material contrast to selectively reflow the top surface of the exposed samples only. This allowed us to create ultra-smooth micro-optical structures by post-processing without influencing the overall geometry that is required for the optical functionality.
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R. Kirchner, R. Hoekstra, N. Chidambaram, H. Schift, "Depth-profiling of vertical material contrast after VUV exposure for contact-free polishing of 3D polymer micro-optics ", Proc. SPIE 10446, 33rd European Mask and Lithography Conference, 1044613 (28 September 2017); doi: 10.1117/12.2279712; https://doi.org/10.1117/12.2279712
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