13 June 2017 A review of interferometric techniques with possible improvement in pattern resolution using near-field patterning
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Proceedings Volume 10449, Fifth International Conference on Optical and Photonics Engineering; 104491B (2017) https://doi.org/10.1117/12.2270638
Event: Fifth International Conference on Optical and Photonics Engineering, 2017, Singapore, Singapore
Abstract
In this paper, we will be initially doing review on the advancement of interference lithography (IL) which is a wellestablished technique for its facile, efficient, and economical approach to achieve large-scale patterning in a wide variety of substrates at sub-wavelength resolution. Following this, we have configured a two-beam IL patterning system to achieve patterns in a photoresist and verified against the theoretically calculated results. This work will be further extended using near-field patterning techniques to improve the resolution of the pattern as compared to the current conventional IL system. It is envisaged that the obtained initial results can be employed in a graphene substrate for further research and applications in the area of flexible electronics.
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J. Y. Pae, J. Y. Pae, Murukeshan V. M., Murukeshan V. M., } "A review of interferometric techniques with possible improvement in pattern resolution using near-field patterning", Proc. SPIE 10449, Fifth International Conference on Optical and Photonics Engineering, 104491B (13 June 2017); doi: 10.1117/12.2270638; https://doi.org/10.1117/12.2270638
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