13 June 2017 A review of interferometric techniques with possible improvement in pattern resolution using near-field patterning
Author Affiliations +
Proceedings Volume 10449, Fifth International Conference on Optical and Photonics Engineering; 104491B (2017) https://doi.org/10.1117/12.2270638
Event: Fifth International Conference on Optical and Photonics Engineering, 2017, Singapore, Singapore
Abstract
In this paper, we will be initially doing review on the advancement of interference lithography (IL) which is a wellestablished technique for its facile, efficient, and economical approach to achieve large-scale patterning in a wide variety of substrates at sub-wavelength resolution. Following this, we have configured a two-beam IL patterning system to achieve patterns in a photoresist and verified against the theoretically calculated results. This work will be further extended using near-field patterning techniques to improve the resolution of the pattern as compared to the current conventional IL system. It is envisaged that the obtained initial results can be employed in a graphene substrate for further research and applications in the area of flexible electronics.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. Y. Pae, Murukeshan V. M., "A review of interferometric techniques with possible improvement in pattern resolution using near-field patterning", Proc. SPIE 10449, Fifth International Conference on Optical and Photonics Engineering, 104491B (13 June 2017); doi: 10.1117/12.2270638; https://doi.org/10.1117/12.2270638
PROCEEDINGS
6 PAGES


SHARE
Back to Top