Front Matter: Volume 10450
Proc. SPIE 10450, Front Matter: Volume 10450, 1045001 (16 November 2017); doi: 10.1117/12.2293159
EUV Readiness: Joint session with conferences 10450 and 10451
Proc. SPIE 10450, EUV lithography industrialization progress, 1045003 (16 October 2017); doi: 10.1117/12.2281184
Proc. SPIE 10450, EUV single patterning for logic metal layers: achievement and challenge (Conference Presentation), 1045004 (); doi: 10.1117/12.2281738
Proc. SPIE 10450, EUV mask manufacturing readiness in the merchant mask industry, 1045005 (16 October 2017); doi: 10.1117/12.2281132
EUV Mask Inspection: Joint session with conferences 10451 and 10450
Proc. SPIE 10450, Classification and printability of EUV mask defects from SEM images, 1045006 (26 October 2017); doi: 10.1117/12.2280837
Proc. SPIE 10450, Actinic inspection of EUV reticles with arbitrary pattern design, 1045007 (16 October 2017); doi: 10.1117/12.2280528
EUV Mask Metrology and Inspection: Joint session with conferences 10450 and 10451
Proc. SPIE 10450, Measurement of through-focus EUV pattern shifts using the SHARP actinic microscope, 1045008 (16 October 2017); doi: 10.1117/12.2280371
Proc. SPIE 10450, EUV Infrastructure: EUV photomask backside cleaning (Conference Presentation), 1045009 (); doi: 10.1117/12.2280387
Proc. SPIE 10450, EUV mask flatness compensation strategies and requirements for reticle flatness, scanner optimization and E-beam writer (Conference Presentation), 104500A (); doi: 10.1117/12.2280464
EUV Mask Pellicle: Joint session with conferences 10451 and 10450
Proc. SPIE 10450, Efficient simulation of EUV pellicles, 104500B (16 October 2017); doi: 10.1117/12.2280535
EUV Mask and Imaging
Proc. SPIE 10450, EUV source optimization driven by fundamental diffraction considerations, 104500C (26 October 2017); doi: 10.1117/12.2280717
Proc. SPIE 10450, Performance and characteristics of the NXE:3400 optical system enabling sub-10nm node lithography (Conference Presentation), 104500D (); doi: 10.1117/12.2280545
Proc. SPIE 10450, Addressing EUV masks registration challenges through closed loop correction (Conference Presentation), 104500E (); doi: 10.1117/12.2281709
Proc. SPIE 10450, Individual multilayer reflectance and near field image formation in an EUV reticle, 104500F (16 October 2017); doi: 10.1117/12.2282008
Proc. SPIE 10450, Single element and metal alloy novel EUV mask absorbers for improved imaging (Conference Presentation), 104500G (); doi: 10.1117/12.2280623
EUV Resist I
Proc. SPIE 10450, Unraveling the role of secondary electrons upon their interaction with photoresist during EUV exposure, 104500H (16 October 2017); doi: 10.1117/12.2281449
Proc. SPIE 10450, Secondary electron interactions of chemically amplified EUV photoresists (Conference Presentation), 104500I (); doi: 10.1117/12.2281810
Proc. SPIE 10450, A novel route to EUV resists design: Fundamental understanding of chemical processes (Conference Presentation), 104500J (); doi: 10.1117/12.2281520
EUV Resists II
Proc. SPIE 10450, High resolution lithography using a multi-trigger resist (Conference Presentation), 104500M (); doi: 10.1117/12.2280537
Proc. SPIE 10450, DDR process and materials for NTD photo resist in EUV lithography, 104500N (16 October 2017); doi: 10.1117/12.2280536
Proc. SPIE 10450, Recent progress of CAR materials for EUV lithography (Conference Presentation), 104500O (); doi: 10.1117/12.2280303
Proc. SPIE 10450, Reducing roughness in extreme ultraviolet lithography, 104500P (16 October 2017); doi: 10.1117/12.2281605
Proc. SPIE 10450, The update of resist outgas testing for metal containing resists at EIDEC, 104500Q (16 October 2017); doi: 10.1117/12.2280443
Student Session: Joint session with conferences 10451 and 10450
Proc. SPIE 10450, Actinic EUV scatterometry for parametric mask quantification (Conference Presentation), 104500R (); doi: 10.1117/12.2281511
Proc. SPIE 10450, EUV mask roughness can recover litho-tool aberrations (Conference Presentation), 104500S (); doi: 10.1117/12.2281519
Proc. SPIE 10450, Evaluating mechanical characteristic of SiNx EUV pellicle membrane (Conference Presentation), 104500T (); doi: 10.1117/12.2281683
High-NA EUV Lithography
Proc. SPIE 10450, High-NA EUV lithography enabling Moore’s law in the next decade, 104500U (16 October 2017); doi: 10.1117/12.2280592
Proc. SPIE 10450, Optical proximity correction for anamorphic extreme ultraviolet lithography, 104500V (16 October 2017); doi: 10.1117/12.2280548
Proc. SPIE 10450, Edge placement error control and Mask3D effects in High-NA anamorphic EUV lithography, 104500W (30 October 2017); doi: 10.1117/12.2280624
Proc. SPIE 10450, Next-generation EUV lithography productivity (Conference Presentation), 104500X (); doi: 10.1117/12.2282183
Proc. SPIE 10450, Taking a SHARP look at mask 3D effects, 104500Y (27 October 2017); doi: 10.1117/12.2281109
EUV Source
Proc. SPIE 10450, High-power LPP-EUV source with long collector mirror lifetime for high volume semiconductor manufacturing, 104500Z (16 October 2017); doi: 10.1117/12.2281129
Proc. SPIE 10450, Challenges to realize the EUV-FEL high-power light source for HVM system (Conference Presentation), 1045010 (); doi: 10.1117/12.2280507
Proc. SPIE 10450, A 1kW EUV source for lithography based on FEL emission in a compact storage ring, 1045011 (16 October 2017); doi: 10.1117/12.2280716
Proc. SPIE 10450, Improved cost-of-ownership for a droplet-based LPP light source for HVM EUV mask and blank inspection (Conference Presentation), 1045012 (); doi: 10.1117/12.2280597
Proc. SPIE 10450, Study of ion enhanced Sn removal by surface wave plasma for source cleaning (Conference Presentation), 1045013 (); doi: 10.1117/12.2280599
EUV Patterning and Process Enhancement I
Proc. SPIE 10450, EUV exposure tool stability at IMEC (Conference Presentation), 1045015 (); doi: 10.1117/12.2281623
Proc. SPIE 10450, EUV local CDU healing performance and modeling capability towards 5nm node, 1045017 (16 October 2017); doi: 10.1117/12.2281627
Proc. SPIE 10450, Roadmap evolution: from NTRS to ITRS, from ITRS 2.0 to IRDS, 1045018 (16 October 2017); doi: 10.1117/12.2280803
EUV Patterning and Process Enhancement II
Proc. SPIE 10450, Single-nm resolution techniques with DDR process and materials (Conference Presentation), 1045019 (); doi: 10.1117/12.2280508
Proc. SPIE 10450, Development of amorphous silicon based EUV hardmasks through physical vapor deposition, 104501A (16 October 2017); doi: 10.1117/12.2280607
Proc. SPIE 10450, Fabrication and performance of transmission engineered molybdenum-rich phase structures in the EUV regime (Conference Presentation), 104501B (); doi: 10.1117/12.2281487
Poster Session: EUV Source
Proc. SPIE 10450, Key components development progress updates of the 250W high power LPP-EUV light source, 104501C (16 October 2017); doi: 10.1117/12.2280503
Poster Session: EUV Resists and Process
Proc. SPIE 10450, A study on enhancing EUV resist sensitivity (2), 104501E (26 October 2017); doi: 10.1117/12.2280377
Proc. SPIE 10450, Technology for defectivity improvement in resist coating and developing process in EUV lithography process, 104501F (16 October 2017); doi: 10.1117/12.2280388
Proc. SPIE 10450, Development of the negative-tone molecular resists for EB/EUVL having high EUV absorption capacity and molecular design method, 104501H (16 October 2017); doi: 10.1117/12.2280514
Poster Session: EUV Pellicles
Proc. SPIE 10450, Lifetime estimation of extreme-ultraviolet pellicle at 500 W source power by thermal stress analysis, 104501K (16 October 2017); doi: 10.1117/12.2280518
Proc. SPIE 10450, Characterization of pellicle membranes by lab-based spectroscopic reflectance and transmittance measurements in the extreme ultraviolet , 104501L (16 October 2017); doi: 10.1117/12.2280579
Proc. SPIE 10450, Search for multi-stack EUV pellicle membrane for EUV non-actinic mask inspection, 104501M (16 October 2017); doi: 10.1117/12.2280618
Proc. SPIE 10450, Thermo-mechanical behavior analysis of extreme-ultraviolet pellicle cooling with H2 flow, 104501N (16 October 2017); doi: 10.1117/12.2280691
Proc. SPIE 10450, Lifetime impact on residual stress of EUV pellicle, 104501O (16 October 2017); doi: 10.1117/12.2280692
Proc. SPIE 10450, Wrinkle formation analysis in extreme-ultraviolet pellicle, 104501Q (26 October 2017); doi: 10.1117/12.2281036
Poster Session: EUV Patterning and Process Enhancement
Proc. SPIE 10450, Contrast matching of line gratings obtained with NXE3XXX and EUV- interference lithography, 104501T (16 October 2017); doi: 10.1117/12.2280541
Proc. SPIE 10450, Coater/developer based techniques to improve high-resolution EUV patterning defectivity, 104501U (16 October 2017); doi: 10.1117/12.2280506