Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 10450, including the Title Page, Copyright information, Table of Contents, and Conference Committee listing.

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Author(s), “Title of Paper,” in International Conference on Extreme Ultraviolet Lithography 2017, edited by Paolo A. Gargini, Patrick P. Naulleau, Kurt G. Ronse, Toshiro Itani, Proceedings of SPIE Vol. 10450 (SPIE, Bellingham, WA, 2017) Seven-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510613744

ISBN: 9781510613751 (electronic)

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Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:

  • The first five digits correspond to the SPIE volume number.

  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc. The CID Number appears on each page of the manuscript.

Authors

Numbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

Abe, Tamotsu, 0Z, 1C

Adam, Kostas, 0V

Bahrenberg, Lukas, 1L, 2A

Ban, Chung-Hyun, 1K

Benk, Markus, 08

Bitter, Manfred L., 24

Broman, Par, 0C

Brose, Sascha, 1L, 2A

Cao, Yong, 1A

Chen, Alek, 05

Chen, Yulu, 08

Chiou, Tsann-Bim, 05

Cho, Wonil, 06

Choi, Peter, 17

Choi, Yohan, 05

Clifford, Chris, 0V

Custers, Rolf, 1T

Dai, Huixiong, 1A

Danylyuk, Serhiy, 1L, 2A

De Silva, Anuja, 1A, 1U

de Simone, Danilo, 0H

Delgado-Aparicio, Luis F., 24

Deutz, Alex F., 27

DeVries, Scott, 1A

Diehl, Daniel L., 1A

Dong, Lisong, 1X

Echigo, Masatoshi, 1H

Efthimion, Philip C., 24

Ekinci, Yasin, 07, 1T

Enomoto, Masashi, 1F

Erdmann, A., 0B

Evanschitzky, P., 0B

Fallica, Roberto, 1T

Fan, Taian, 1X

Felix, Nelson M., 1A, 1U

Fenger, Germain, 0V

Fernandez, Sara, 07

Finders, Jo, 0C

Fonseca, Carlos, 17

Foubert, Philippe, 1F

Gallagher, Emily, 1L

Gao, Lan, 24

Gao, Weimin, 0F

Gargini, Paolo A., 18

Goldberg, Kenneth, 08

Green, Michael, 05

Ham, Young, 05

Harada, Tetsuo, 1E, 1H

Hashimoto, Yusaku, 1U

Helfenstein, Patrick, 07

Hetzer, Dave, 1U

Hill, Kenneth W., 24

Hoefnagels, Rik, 1T

Hontake, Koichi, 1U

Hori, Tsukasa, 0Z, 1C

Hsiao, Li-Jen, 21

Hubbard, Alex, 1U

Huli, Lior, 1U

Hur, Su-Mi, 1M

Ichinomiya, Hiroshi, 1F

Ishii, Takuya, 1C

Isoyan, Artak, 0F

Itou, Noritoshi, 1C

Jee, Tae Kwon, 17

Jeong, Hae-Nam, 1Q

Jiang, Fan, 0V

Jiang, Jing, 0H

Johnson, Richard, 1U

Juschkin, Larissa, 2A

Kamberian, Henry, 05, 08

Kamei, Yuya, 1F

Kandel, Yudhi, 0F

Kang, Myung-Gi, 1N

Kasprowicz, Bryan, 08

Kawakami, Shinichiro, 1F, 1U

Kawasuji, Yasufumi, 0Z, 1C

Kazazis, Dimitrios, 07

Kerkhof, Peter J., 27

Kim, Guk-Jin, 1M, 1Q

Kim, Min-Woo, 1O

Ko, Akiteru, 1U

Kodama, Takeshi, 0Z, 1C

Koike, Kyohei, 17

Koster, Norbert B., 27

Kraus, Brian F., 24

Kudo, Hiroto, 1H

Lam, Michael, 0V

Lammers, Ad, 05

Lebert, Rainer, 2A

Lee, Sung-Gyu, 1M, 1N, 1O, 1Q

Lemley, Corey, 1U

Lin, Hoang-Yan, 21

Liu, Eric, 1U

Loosen, Peter, 1L, 2A

Lu, Jian, 24

Mack, Chris A., 0P

Mangat, Pawitter, 08

Matsumoto, Yoko, 1E

McCord, Jeremy, 08

McNamara, John, 0C

Meeuwissen, Marieke, 1T

Meli, Luciana, 1A, 1U

Melvin, Lawrence S., 0F

Mignot, Yann, 1A

Miyao, Kenichi, 1C

Miyazaki, Junji, 05

Mizoguchi, Hakaru, 0Z, 1C

Mochi, Iacopo, 07, 1T

Molkenboer, Freek T., 27

Morgan, Paul A., 06

Muilwijk, Pim M., 27

Mulckhuyse, Wouter, 27

Murray, Cody, 1U

Nafus, Kathleen, 1F

Naito, Michiya, 1E

Nakarai, Hiroaki, 0Z, 1C

Ngai, Christopher S., 1A

Nowak, Krzysztof M., 0Z

Oh, Hye-Keun, 1K, 1M, 1N, 1O, 1Q

Okamoto, Takeshi, 1C

Olvera, Karen Garrido, 1T

Oostdijck, Bastiaan W., 27

Pablant, Novimir A., 24

Park, Eun-Sang, 1K, 1N, 1O

Park, Jae-Hun, 1K

Petrillo, Karen, 1U

Phan, Khoi, 1A

Pollentier, Ivan, 0H, 1L

Price, Daniel, 06

Progler, Chris, 05

Raghunathan, Ananthan, 0V

Rajeev, Rajendran, 07

Rio, David, 17

Rispens, Gijsbert, 1T

Rost, Daniel, 06

Saitou, Takashi, 0Z, 1C

Satake, Masaki, 06

Sato, Takashi, 1H

Schoofs, Stijn, 17

Sekiguchi, Atsushi, 1E

Seshadri, Indira, 1A

Shimoaoki, Takeshi, 1U

Shiozawa, Takahiro, 1F

Shiraishi, Yutaka, 0Z, 1C

Soumagne, Georg, 0Z

Stolfi, Michael, 1A

Stollenwerk, Jochen, 1L

Takigawa, Tomoaki, 1H

Tanaka, Hiroshi, 0Z, 1C

Tanaka, Koichiro, 1U

Tasdemir, Zuhal, 1T

te Sligte, Edwin, 27

Timmermans, Marina, 1L

Timoshkov, Vadim, 17

Togashi, Yuta, 1H

Toida, Takumi, 1H

Tolani, Vikram L., 06

Tsai, Yu-Cheng, 17

Tseng, Shih-En, 05

Utsumi, Yoshiyuki, 1E

van Adrichem, Paul, 0C

van der Walle, Peter, 27

van Putten, Michel, 27

van Setten, Eelco, 0C

Vanelderen, Pieter, 0H

Vesters, Yannick, 0H

Vockenhuber, Michaela, 1T

Wallow, Thomas, 08

Wang, Erik, 0C

Watanabe, Takeo, 1E, 1H

Watanabe, Yukio, 0Z, 1C

Wei, Yayi, 1X

Westerhout, Jeroen, 27

Wood, Obert, 08

Xu, Yongan, 1A, 1U

Yabu, Takayuki, 1C

Yaegashi, Hidetami, 17

Yamada, Tsuyoshi, 0Z

Yamazaki, Taku, 0Z, 1C

Yanagida, Tatsuya, 0Z, 1C

Yildirim, Oktay, 1T

Yoshitake, Shusuke, 07

Zeng, Wilson, 1A

Conference Committee

Conference Chairs

  • Paolo A. Gargini, Stanford University (United States)

  • Patrick P. Naulleau, Lawrence Berkeley National Laboratory (United States)

  • Kurt G. Ronse, IMEC (Belgium)

  • Toshiro Itani, EUVL Infrastructure Development Center, Inc. (Japan)

Conference Program Committee

  • Eric M. Panning, Intel Corporation (United States)

  • Winfried Kaiser, Carl Zeiss SMT GmbH (Germany)

  • Satoshi Tanaka, EUVL Infrastructure Development Ctr., Inc. (Japan)

  • Eric Hendrickx, IMEC (Belgium)

Session Chairs

  • Keynote Session: Joint Session with conferences 10451 and 10450

  • Eric M. Panning, Intel Corporation (United States)

  • Naoya Hayashi, Dai Nippon Printing Company, Ltd. (Japan)

  • EUV Readiness: Joint session with conferences 10450 and 10451

  • Eric M. Panning, Intel Corporation (United States)

  • Naoya Hayashi, Dai Nippon Printing Company, Ltd. (Japan)

  • EUV Mask Inspection: Joint session with conferences 10451 and 10450

  • Paul A. Morgan, Micron Technology, Inc. (United States)

  • EUV Mask Metrology and Inspection: Joint session with conferences 10450 and 10451

  • Bryan S. Kasprowicz, Photronics, Inc. (United States)

  • Thomas Scheruebl, Carl Zeiss SMT GmbH (Germany)

  • EUV Mask Pellicle: Joint session with conferences 10451 and 10450

  • Emily E. Gallagher, IMEC (Belgium)

  • Dario L. Goldfarb, IBM Thomas J. Watson Research Center (United States)

  • EUV Mask and Imaging

  • Peter Evanschitzky, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)

  • Jin-ho Ahn, Hanyang University (Korea, Republic of)

  • EUV Resist I

  • Gregory H. Denbeaux, SUNY Polytechnic Institute (United States)

  • Takahiro Kozawa, Osaka University (Japan)

  • EUV Resists II

  • Eishi Shiobara, EUVL Infrastructure Development Center, Inc. (Japan)

  • Student Session: Joint session with conferences 10451 and 10450

  • Yuyang Sun, Mentor Graphics Corporation (United States)

  • Shinji Okazaki, ALITECS Company, Ltd. (Japan)

  • High-NA EUV Lithography

  • Winfried Kaiser, Carl Zeiss SMT GmbH (Germany)

  • Erik R. Hosler, GLOBALFOUNDRIES Inc. (United States)

  • EUV Source

  • Jan van Schoot, ASML Netherlands B.V. (Netherlands)

  • Sang Hun Lee, Intel Corporation (United States)

  • EUV Patterning and Process Enhancement I

  • Ryoung-Han Kim, IMEC (Belgium)

  • EUV Patterning and Process Enhancement II

  • Akiyoshi Suzuki, Gigaphoton Inc. (Japan)

  • Wang Yueh, Intel Corporation (United States)

© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
} "Front Matter: Volume 10450", Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, 1045001 (16 November 2017); doi: 10.1117/12.2293159; https://doi.org/10.1117/12.2293159
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