EUV lithography industrialization progress

Roderik van Es; Mark van de Kerkhof; Hans Jasper; Leon Levasier; Rudy Peeters

doi:10.1117/12.2281184

16 October 2017 EUV lithography industrialization progress

Roderik van Es, Mark van de Kerkhof, Hans Jasper, Leon Levasier, Rudy Peeters

Proceedings Volume 10450, International Conference on Extreme Ultraviolet Lithography 2017; 1045003 (2017) https://doi.org/10.1117/12.2281184
Event: SPIE Photomask Technology and EUV Lithography, 2017, Monterey, California, United States

Abstract

This presentation will provide an overview of the industrialization of EUV Lithography, including the latest data on imaging, overlay, defectivity and source power/ productivity. The focus of the presentation will be on the NXE:3400B scanner, ASML’s fifth generation EUV lithography tool intended for the sub 10 nm volume production Furthermore the ASML roadmap, NXE:3300B and NXE:3350B field data and field performance data will be shown

Conference Presentation

Citation Download Citation

Roderik van Es, Mark van de Kerkhof, Hans Jasper, Leon Levasier, and Rudy Peeters "EUV lithography industrialization progress", Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, 1045003 (16 October 2017); https://doi.org/10.1117/12.2281184

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