16 October 2017 EUV lithography industrialization progress
Author Affiliations +
Abstract
This presentation will provide an overview of the industrialization of EUV Lithography, including the latest data on imaging, overlay, defectivity and source power/ productivity. The focus of the presentation will be on the NXE:3400B scanner, ASML’s fifth generation EUV lithography tool intended for the sub 10 nm volume production Furthermore the ASML roadmap, NXE:3300B and NXE:3350B field data and field performance data will be shown
Conference Presentation
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Roderik van Es, Roderik van Es, Mark van de Kerkhof, Mark van de Kerkhof, Hans Jasper, Hans Jasper, Leon Levasier, Leon Levasier, Rudy Peeters, Rudy Peeters, } "EUV lithography industrialization progress", Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, 1045003 (16 October 2017); doi: 10.1117/12.2281184; https://doi.org/10.1117/12.2281184
PROCEEDINGS
17 PAGES + PRESENTATION

SHARE
Back to Top