16 October 2017 Measurement of through-focus EUV pattern shifts using the SHARP actinic microscope
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This paper provides experimental measurements of through-focus pattern shifts between contact holes in a dense array and a surrounding pattern of lines and spaces using the SHARP actinic microscope in Berkeley. Experimental values for pattern shift in EUV lithography due to 3D mask effects are extracted from SHARP microscope images and benchmarked with pattern shift values determined by rigorous simulations.
Conference Presentation
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Obert Wood, Obert Wood, Yulu Chen, Yulu Chen, Pawitter Mangat, Pawitter Mangat, Kenneth Goldberg, Kenneth Goldberg, Markus Benk, Markus Benk, Bryan Kasprowicz, Bryan Kasprowicz, Henry Kamberian, Henry Kamberian, Jeremy McCord, Jeremy McCord, Thomas Wallow, Thomas Wallow, } "Measurement of through-focus EUV pattern shifts using the SHARP actinic microscope", Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, 1045008 (16 October 2017); doi: 10.1117/12.2280371; https://doi.org/10.1117/12.2280371


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