27 October 2017 Taking a SHARP look at mask 3D effects
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Mask 3D effects are an area of active research in EUV mask technology. Mask-side numerical aperture, illumination, feature size and absorber thickness are key factors modulating mask 3D effects and affecting printability and process window. Variable mask-side NA and flexible illumination make the SHARP actinic EUV microscope a powerful instrument for the study of mask 3D effects. We show an application example, comparing mask 3D effects for a standard Tantalum Nitride absorber and a thinner, 40-nm Nickel absorber. Data is presented for 0.33 4xNA and anamorphic 0.55 4x/8xNA. The influence of different illumination settings on mask 3D effects is discussed.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Markus P. Benk, Markus P. Benk, Weilun Chao, Weilun Chao, Ryan Miyakawa, Ryan Miyakawa, Kenneth Goldberg, Kenneth Goldberg, Patrick Naulleau, Patrick Naulleau, } "Taking a SHARP look at mask 3D effects", Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, 104500Y (27 October 2017); doi: 10.1117/12.2281109; https://doi.org/10.1117/12.2281109


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