16 October 2017 Key components development progress updates of the 250W high power LPP-EUV light source
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Abstract
Gigaphoton Inc. is developing a CO2-Sn-LPP EUV light source based on unique and original technologies including a high power CO2laser with 15 nanosecond pulse duration, a solid-state pre-pulse laser with 10 picosecond pulse duration, a highly stabilized droplet generator, a precise laser-droplet shooting control system and a debris mitigation system using a magnetic field. In this paper, an update of the development progress of our 250W CO2-Sn-LPP EUV light source and of the key components is presented.
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Takayuki Yabu, Yasufumi Kawasuji, Tsukasa Hori, Takeshi Okamoto, Hiroshi Tanaka, Kenichi Miyao, Takuya Ishii, Yukio Watanabe, Tatsuya Yanagida, Yutaka Shiraishi, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Noritoshi Itou, Takashi Saito, Hakaru Mizoguchi, "Key components development progress updates of the 250W high power LPP-EUV light source", Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, 104501C (16 October 2017); doi: 10.1117/12.2280503; https://doi.org/10.1117/12.2280503
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