16 October 2017 Lifetime estimation of extreme-ultraviolet pellicle at 500 W source power by thermal stress analysis
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The analysis of the thermal stress and the extreme-ultraviolet (EUV) pellicle is important since the pellicle could be easily damaged since the thickness of the pellicle is 50 nm thin due to 90% required EUV transmission. One of the solution is using a high emissivity metallic material on the both sides of the pellicle and it can lower the thermal stress. However, using a metallic coating on pellicle core which is usually consist of silicon group can decrease the EUV transmission compared to using a single core layer pellicle only. Therefore, we optimized thermal and optical properties of the pellicle and elect three types of the pellicle. In this paper we simulated our optimized pellicles with 500W source power. The result shows that the difference of the thermal stress is small for each case. Therefore, our result also shows that using a high emissivity coating is necessary since the cooling of the pellicle strongly depends on emissivity and it can lower the stress effectively even at high EUV source power.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eun-Sang Park, Eun-Sang Park, Chung-Hyun Ban, Chung-Hyun Ban, Jae-Hun Park, Jae-Hun Park, Hye-Keun Oh, Hye-Keun Oh, } "Lifetime estimation of extreme-ultraviolet pellicle at 500 W source power by thermal stress analysis", Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, 104501K (16 October 2017); doi: 10.1117/12.2280518; https://doi.org/10.1117/12.2280518


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