16 October 2017 Thermo-mechanical behavior analysis of extreme-ultraviolet pellicle cooling with H2 flow
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To protect the extreme-ultraviolet (EUV) mask from contaminations, the EUV pellicle is required. Internal temperature of EUV pellicle is increased during exposure process and then, thermal stress is also varied owing to increased temperature of EUV pellicle, so that the EUV pellicle will be broken. The cooling system by hydrogen gas (H2) flow is used to reduce internal temperature of EUV pellicle during exposure process. In order to determine the effect of cooling, we simulated variation of temperature and thermal stress for EUV pellicle membranes by using finite element method (FEM). Also, we considered a film coefficient with a few nanometer EUV pellicle thickness as simulation parameter. As a result, we determined that the cooling system of EUV pellicle by using H2 flow is efficient to decrease temperature and thermal stress of EUV pellicle during exposure process.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Myung-Gi Kang, Myung-Gi Kang, Sung-Gyu Lee, Sung-Gyu Lee, Eun-Sang Park, Eun-Sang Park, Hye-Keun Oh, Hye-Keun Oh, "Thermo-mechanical behavior analysis of extreme-ultraviolet pellicle cooling with H2 flow", Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, 104501N (16 October 2017); doi: 10.1117/12.2280691; https://doi.org/10.1117/12.2280691


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