Lifetime impact on residual stress of EUV pellicle

Min-Woo Kim; Sung-Gyu Lee; Eun-Sang Park; Hye-Keun Oh

doi:10.1117/12.2280692

16 October 2017 Lifetime impact on residual stress of EUV pellicle

Min-Woo Kim, Sung-Gyu Lee, Eun-Sang Park, Hye-Keun Oh

Proceedings Volume 10450, International Conference on Extreme Ultraviolet Lithography 2017; 104501O (2017) https://doi.org/10.1117/12.2280692
Event: SPIE Photomask Technology and EUV Lithography, 2017, Monterey, California, United States

Abstract

Since EUV pellicle is very thin, It can be affected easily on its manufacturing process or the exposure process. The Pellicle has several types of stress, above all the pellicle has a residual stress from its manufacturing process. To determine the effect of residual stress on the pellicle, we calculated residual stress of several types of multi-layer pellicle by using formula. We could confirm that the residual stress has non-negligible values through the calculation results, and we obtained the thermal stress of each pellicle by using finite element method (FEM). we optimized the pellicle through comparison of total stress by plus the calculated residual stress and the thermal stress. As a result, since the p-Si core pellicle with B₄C capping satisfies both high transparent and low total stress, we chose p-Si core pellicle with B₄C capping as a suitable pellicle.

Citation Download Citation

Min-Woo Kim, Sung-Gyu Lee, Eun-Sang Park, and Hye-Keun Oh "Lifetime impact on residual stress of EUV pellicle", Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, 104501O (16 October 2017); https://doi.org/10.1117/12.2280692

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