26 October 2017 Wrinkle formation analysis in extreme-ultraviolet pellicle
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Abstract
In EUV lithography, one of problems is defect control, so that the EUV pellicle is required to protect EUV mask from contaminations. The EUV pellicle should be extremely thin thickness and it is easy to be deformed as wrinkle and deflection during the manufacturing and exposure process due to structural problems. The deformation can change a transmission of EUV pellicle. The variation in transmission induces the CD variation on the wafer. In this study, various structures for EUV pellicle were considered and non-uniform and uniform wrinkles caused by mechanical deformation were calculated. Even very small wrinkles are amplified by acceleration and even if just deflected pellicle produce the wrinkles.
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Hae-Nam Jeong, Guk-Jin Kim, Sung-Gyu Lee, Hye-Keun Oh, "Wrinkle formation analysis in extreme-ultraviolet pellicle", Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, 104501Q (26 October 2017); doi: 10.1117/12.2281036; https://doi.org/10.1117/12.2281036
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