2017 mask maker survey conducted by the eBeam Initiative

Aki Fujimura; Jan Willis

doi:10.1117/12.2280591

16 October 2017 2017 mask maker survey conducted by the eBeam Initiative

Aki Fujimura, Jan Willis

Proceedings Volume 10451, Photomask Technology 2017; 1045103 (2017) https://doi.org/10.1117/12.2280591
Event: SPIE Photomask Technology and EUV Lithography, 2017, Monterey, California, United States

Abstract

Captive and merchant mask makers participated in an anonymous survey in the summer of 2017 to capture the profile of the mask industry for the period of July 2016 through June 2017. A mask industry survey has been conducted for the 15th time in the past 16 years. Sematech ran the mask industry survey for 13 years through 2013. In 2015, the eBeam Initiative invested in reviving a subset of the survey called the Mask Maker Survey. The eBeam Initiative’s third Mask Maker Survey in 2017 covers a number of questions related to the profile of the mask industry, from overall number of masks to pattern generation type. The survey addresses questions about data preparation, writing and delivery times. Mask yields and returns are captured along with a new question on the usage of mask process correction (MPC) by ground rules. The eBeam Initiative also conducts an annual Perceptions Survey of mask industry luminaries.

Conference Presentation

Citation Download Citation

Aki Fujimura and Jan Willis "2017 mask maker survey conducted by the eBeam Initiative", Proc. SPIE 10451, Photomask Technology 2017, 1045103 (16 October 2017); https://doi.org/10.1117/12.2280591

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