An efficient tool to rewrite a VSB12 format jobdeck for any target VSB12 machine

Juan Olate; Gary Meyers

doi:10.1117/12.2280586

16 October 2017 An efficient tool to rewrite a VSB12 format jobdeck for any target VSB12 machine

Juan Olate, Gary Meyers

Proceedings Volume 10451, Photomask Technology 2017; 1045107 (2017) https://doi.org/10.1117/12.2280586
Event: SPIE Photomask Technology and EUV Lithography, 2017, Monterey, California, United States

Abstract

NuFlare has several VSB mask writers which read in patterns in the VSB12 format. Each type of machine has restrictions over the input VSB12 chips they can read; mainly the file-size of input files. MDP software tools — which are used to convert the customers layout designs into VSB12 format files — can generate VSB12 chips for a given VSB12 machine model. However, the generated VSB12 chip might not be compatible for printing in other VSB12 machine models other than the one specified. This is very inconvenient for some mask manufacturers, as it hinders the flexibility of their processes. They might require to write a previously generated VSB12 chip in a different machine model than the originally specified one. This paper presents a tool that can convert VSB12 jobdeck files to be compatible with a different VSB12 machine model than originally intended. It generates the new VSB12 jobdeck in a time considerably shorter than refracturing it with a MDP tool and comparable to just file copying it.

Conference Presentation

Citation Download Citation

Juan Olate and Gary Meyers "An efficient tool to rewrite a VSB12 format jobdeck for any target VSB12 machine", Proc. SPIE 10451, Photomask Technology 2017, 1045107 (16 October 2017); https://doi.org/10.1117/12.2280586

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