31 October 2017 Full-chip GPU-accelerated curvilinear EUV dose and shape correction
Author Affiliations +
Abstract
With both 193i multiple patterning and EUV technologies, the constraints on the mask manufacturability are becoming increasingly stringent. The necessity for understanding curvilinear shapes implicitly in design (for ILT and EUV) or OPC correction (corner-rounding effects) along with new multi-beam mask writing systems mean the mask manufacturers are at an inflection point: whether the mask shapes are described as curvilinear targets or complex rectilinear targets, the actual mask shapes after exposure are curvilinear and must be accounted for correctly for wafer lithography. We present a GPU-accelerated intrinsically curvilinear mask data preparation system, compatible with both VSB and multi-beam systems, that is capable of full-ship simultaneous shape and dose correction using arbitrary (non-Gaussian) kernels for model shape and dose effects.
Conference Presentation
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ryan Pearman, Ryan Pearman, Abhishek Shendre, Abhishek Shendre, Oleg Syrel, Oleg Syrel, Harold Zable, Harold Zable, Ali Bouaricha , Ali Bouaricha , Mariusz Niewczas , Mariusz Niewczas , Bo Su , Bo Su , Leo Pang , Leo Pang , Aki Fujimura, Aki Fujimura, "Full-chip GPU-accelerated curvilinear EUV dose and shape correction", Proc. SPIE 10451, Photomask Technology, 1045108 (31 October 2017); doi: 10.1117/12.2281686; https://doi.org/10.1117/12.2281686
PROCEEDINGS
9 PAGES + PRESENTATION

SHARE
RELATED CONTENT


Back to Top