16 October 2017 Actinic review of EUV masks: challenges and achievements in delivering the perfect mask for EUV production
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Abstract
Actinic review of potential defect sites and verification of their repair is a key step in producing defect free masks. The AIMSTM systems are the industry proven standard for this task and the AIMSTM EUV has been developed to provide this functionality for EUV masks. Thereby it closes an important gap in the EUV mask infrastructure for volume production. In this paper, we show the readiness of the AIMSTM EUV for defect review and verification, and discuss the use of actinic aerial image metrology beyond this core application. In particular, we show measurements on mask 3D effects and the contribution of photon stochastics on wafer local CDU.
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Dirk Hellweg, Dirk Hellweg, Martin Dietzel, Martin Dietzel, Renzo Capelli, Renzo Capelli, Conrad Wolke, Conrad Wolke, Grizelda Kersteen, Grizelda Kersteen, Markus Koch, Markus Koch, Ralf Gehrke, Ralf Gehrke, } "Actinic review of EUV masks: challenges and achievements in delivering the perfect mask for EUV production", Proc. SPIE 10451, Photomask Technology, 104510J (16 October 2017); doi: 10.1117/12.2280689; https://doi.org/10.1117/12.2280689
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