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16 October 2017 Estimated mask contours: potential applications
John Gookassian, Carlos Rojas
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Proceedings Volume 10451, Photomask Technology 2017; 104510Y (2017) https://doi.org/10.1117/12.2280608
Event: SPIE Photomask Technology and EUV Lithography, 2017, Monterey, California, United States
Abstract
Mask writers have evolved significantly in the last decade, and many modern ones include some level of process error correction. However, the feature sizes were shrinking at even faster rate, so the ratio of error to feature size has grown to a level that can no longer be ignored. Even “ideal” process will still produce some rounded contours on the mask. This paper discusses potential applications for the mask contour approximation, such as manufacturing rule check, inspection, metrology and mask error correction. We also discuss and compare possible approaches to generate the mask contours.
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John Gookassian and Carlos Rojas "Estimated mask contours: potential applications", Proc. SPIE 10451, Photomask Technology 2017, 104510Y (16 October 2017); https://doi.org/10.1117/12.2280608
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KEYWORDS
Inspection
Metrology
Manufacturing
SRAF
Process modeling
Computer simulations
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