Multi-beam mask writer MBM-1000

Hiroshi Matsumoto; Hideo Inoue; Hiroshi Yamashita; Ryosuke Ueba; Kenji Otoshi; Hirokazu Yamada; Jin Choi; Byoung-Sup Ahn; Jong-Mun Park; Sang-Hee Lee; Shuichi Tamamushi; Chan-Uk Jeon

doi:10.1117/12.2280502

16 October 2017 Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita, Ryosuke Ueba, Kenji Otoshi, Hirokazu Yamada, Jin Choi, Byoung-Sup Ahn, Jong-Mun Park, Sang-Hee Lee, Shuichi Tamamushi, Chan-Uk Jeon

Author Affiliations +

Proceedings Volume 10451, Photomask Technology 2017; 1045117 (2017) https://doi.org/10.1117/12.2280502
Event: SPIE Photomask Technology and EUV Lithography, 2017, Monterey, California, United States

Abstract

Multi-beam mask writer MBM-1000 is developed for N5. It is designed to accomplish higher throughput than a singlebeam VSB writer EBM-9500 at shot count higher than 500 G/pass, and write masks with low sensitivity resist to have better CDU and patterning resolution. Product version of blanking aperture array (BAA) for MBM-1000 is fabricated along with data transfer system to accomplish data rate of 300 Gbps. They have been integrated with writing control software based on MBF format, a tool-specific format which handles any-angle pattern and polygon patterns. Writing test without re-adjustment of beam current showed that exposure time control by BAA blanking is very stable, and linear CD drift is less than 0.1 nm for 10 hours. Complex OPC pattern and ring pattern were printed on low-sensitivity pCAR resist and showed good resolution to resolve 25 nm isolated line.

Citation Download Citation

Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita, Ryosuke Ueba, Kenji Otoshi, Hirokazu Yamada, Jin Choi, Byoung-Sup Ahn, Jong-Mun Park, Sang-Hee Lee, Shuichi Tamamushi, and Chan-Uk Jeon "Multi-beam mask writer MBM-1000", Proc. SPIE 10451, Photomask Technology 2017, 1045117 (16 October 2017); https://doi.org/10.1117/12.2280502

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