16 October 2017 Dual-line fabrication method in direct laser lithography to reduce the manufacturing time of diffractive optics elements
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Abstract
In order to reduce the fabrication time of the diffractive optical elements (DOEs), a new process is proposed by combining the laser ablation phenomenon using the laser intensity in the conventional thermochemical process. The basic mechanism of the proposed method and experimental results are also presented. We confirmed the effect of reducing the movement distance of the stage for the production of the overall lithography when we made repetitive square patterns. The time reduction rate is drastically improved when the number of patterns is increased. Various patterns including rectangular, triangular, parallelogram, and diamond shape were fabricated by using the proposed method.
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Young-Gwang Kim, Young-Gwang Kim, Hyug-Gyo Rhee, Hyug-Gyo Rhee, Young-Sik Ghim, Young-Sik Ghim, Ho-Soon Yang, Ho-Soon Yang, Yun-Woo Lee, Yun-Woo Lee, } "Dual-line fabrication method in direct laser lithography to reduce the manufacturing time of diffractive optics elements", Proc. SPIE 10451, Photomask Technology, 104511R (16 October 2017); doi: 10.1117/12.2280620; https://doi.org/10.1117/12.2280620
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