13 July 2017 Influence of the pellicle for FPD for i-line single wavelength exposure
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Abstract
The miniaturization technology of the FPD panel have been advanced continuously, and it is said that the reducing rate is about 0.7 times for three years. Therefore, an exposure equipment of the 1.5 μm resolution was released from manufacturers in 2016. As one of some methods to realize 1.5 μm resolution, change from the broadband light to i-line single wavelength light has been selected. However, it is known that CD uniformity is become large, when a conventional pellicle is used in i-line single wavelength exposure[1]. Therefore, it is needed products suitable for i-line single wavelength exposure. In this paper, influence of the pellicle is investigated between conventional pellicle and i-line pellicle. Keywords:FPD, pellicle, i-line, resolution, CD uniformity.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kimiyuki Maruyama, Kimiyuki Maruyama, Sadayuki Hirayama, Sadayuki Hirayama, Kohei Yano, Kohei Yano, Takashi Fujikawa, Takashi Fujikawa, Masakatsu Hirano, Masakatsu Hirano, Tatsunori Nakahara, Tatsunori Nakahara, Yuji Maruyama, Yuji Maruyama, Noriko Tani, Noriko Tani, } "Influence of the pellicle for FPD for i-line single wavelength exposure", Proc. SPIE 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 1045403 (13 July 2017); doi: 10.1117/12.2279552; https://doi.org/10.1117/12.2279552
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