13 July 2017 Cycle time reduction by Html report in mask checking flow
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Abstract
The Mask Data Correctness Check (MDCC) is a reticle-level, multi-layer DRC-like check evolved from mask rule check (MRC). The MDCC uses extended job deck (EJB) to achieve mask composition and to perform a detailed check for positioning and integrity of each component of the reticle. Different design patterns on the mask will be mapped to different layers. Therefore, users may be able to review the whole reticle and check the interactions between different designs before the final mask pattern file is available. However, many types of MDCC check results, such as errors from overlapping patterns usually have very large and complex-shaped highlighted areas covering the boundary of the design. Users have to load the result OASIS file and overlap it to the original database that was assembled in MDCC process on a layout viewer, then search for the details of the check results. We introduce a quick result-reviewing method based on an html format report generated by Calibre® RVE. In the report generation process, we analyze and extract the essential part of result OASIS file to a result database (RDB) file by standard verification rule format (SVRF) commands. Calibre® RVE automatically loads the assembled reticle pattern and generates screen shots of these check results. All the processes are automatically triggered just after the MDCC process finishes. Users just have to open the html report to get the information they need: for example, check summary, captured images of results and their coordinates.
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Jian-Cheng Chen, Jian-Cheng Chen, Min-Ying Lu, Min-Ying Lu, Xiang Fang, Xiang Fang, Ming-Feng Shen, Ming-Feng Shen, Shou-Yuan Ma, Shou-Yuan Ma, Chuen-Huei Yang, Chuen-Huei Yang, Joe Tsai, Joe Tsai, Rachel Lee, Rachel Lee, Erwin Deng, Erwin Deng, Ling-Chieh Lin, Ling-Chieh Lin, Hung-Yueh Liao, Hung-Yueh Liao, Jenny Tsai, Jenny Tsai, Amanda Bowhill, Amanda Bowhill, Hien Vu, Hien Vu, Gordon Russell, Gordon Russell, } "Cycle time reduction by Html report in mask checking flow", Proc. SPIE 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540G (13 July 2017); doi: 10.1117/12.2278691; https://doi.org/10.1117/12.2278691
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