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13 July 2017 Data preparation in the age of curvilinear patterns
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The number of curvilinear patterns present on the masks will increase drastically in the next generations of semiconductor devices. Multibeam mask writers are foreseen to enable a more widespread use of curvilinear shapes. Several applications can benefit from curvilinear patterns like silicon photonics or Inverse Lithography Technology (ILT). We propose a set of innovative algorithms that uses a dedicated representation for curvilinear patterns. This approach simplifies the data handling and decreases file size by reducing the degree of freedom on the database. It also allows improving the output quality with a more precise control of the geometric correction. We illustrate the benefit of using the curvilinear data representation to the Mask Proximity correction and Mask Rule Check.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sébastien Bayle, Charles Tiphine, Matthieu Milléquant, Thiago Figueiro, Luc Martin, Sergei Postnikov, and Patrick Schiavone "Data preparation in the age of curvilinear patterns", Proc. SPIE 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540H (13 July 2017);

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