13 July 2017 MTO-like reference mask modeling for advanced inverse lithography technology patterns
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Advanced Inverse Lithography Technology (ILT) can result in mask post-OPC databases with very small address units, all-angle figures, and very high vertex counts. This creates mask inspection issues for existing mask inspection database rendering. These issues include: large data volumes, low transfer rate, long data preparation times, slow inspection throughput, and marginal rendering accuracy leading to high false detections. This paper demonstrates the application of a new rendering method including a new OASIS-like mask inspection format, new high-speed rendering algorithms, and related hardware to meet the inspection challenges posed by Advanced ILT masks.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jongju Park, Jongju Park, Jongin Moon, Jongin Moon, Suein Son, Suein Son, Donghoon Chung, Donghoon Chung, Byung-Gook Kim, Byung-Gook Kim, Chan-Uk Jeon, Chan-Uk Jeon, Patrick LoPresti, Patrick LoPresti, Shan Xue, Shan Xue, Sonny Wang, Sonny Wang, Bill Broadbent, Bill Broadbent, Soonho Kim, Soonho Kim, Jiuk Hur, Jiuk Hur, Min Choo, Min Choo, } "MTO-like reference mask modeling for advanced inverse lithography technology patterns", Proc. SPIE 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540J (13 July 2017); doi: 10.1117/12.2282406; https://doi.org/10.1117/12.2282406


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