13 July 2017 Exposure characteristics of positive tone electron beam resist containing p-chloro-α-methylstyrene
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Abstract
The positive tone resist consisted of methyl-α-chloroacrylate (ACM) and α-methylstyrene (MS) has higher sensitivity and higher dry etching resistance than poly (methylmethacrylate) (PMMA) due to the presence of a chlorine atom and a phenyl group. Copolymers consisted of ACM and p-chloro-α-methylstyrene (PCMS), where the additional chlorine atom is introduced in phenyl group compared with ACM-MS resist are synthesized and their exposure characteristics are investigated. ACM-PCMS resist with the ACM:PCMS composition ratio of 49:51 indicates the high solubility for amyl acetate developer. As the ACM composition ratio increases, the solubility of ACM-PCMS resist is suppressed. In both ACM-PCMS and ACM-MS resists, the sensitivity decreases while the contrast increases with increasing ACM ratio. When the composition ratio of ACM:PCMS is 69:31, 100/100 nm line and space pattern having a good shape is obtained at 120 μC/cm2 which is comparable to the required exposure dose for conventional ACM-MS resist with ACM:MS=50:50. Dry etching resistance of ACM:PCMS resists for Ar gas is also presented.
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Shunsuke Ochiai, Shunsuke Ochiai, Tomohiro Takayama, Tomohiro Takayama, Yukiko Kishimura, Yukiko Kishimura, Hironori Asada, Hironori Asada, Manae Sonoda, Manae Sonoda, Minako Iwakuma, Minako Iwakuma, Ryoichi Hoshino, Ryoichi Hoshino, } "Exposure characteristics of positive tone electron beam resist containing p-chloro-α-methylstyrene", Proc. SPIE 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 1045414 (13 July 2017); doi: 10.1117/12.2279079; https://doi.org/10.1117/12.2279079
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