31 January 2018 Single nano-digit and closed-loop scanning probe lithography for manufacturing of electronic and optical nanodevices
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Abstract
Next-generation electronic and optical devices demand high-resolution patterning techniques and high-throughput fabrication. Thereby Field-Emission Scanning Probe Lithography (FE-SPL) is a direct writing method that provides high resolution, excellent overlay alignment accuracy and high fidelity nanopatterns. As a demonstration of the patterning technology, single-electron transistors as well as split ring electromagnetic resonators are fabricated through a combination of FE-SPL and plasma etching at cryogenic temperatures.
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Ivo W. Rangelow, Ivo W. Rangelow, Claudia Lenk , Claudia Lenk , Martin Hofmann , Martin Hofmann , Tzvetan Ivanov, Tzvetan Ivanov, Steve Lenk, Steve Lenk, Elshad Guliyev, Elshad Guliyev, Marcus Kaestner, Marcus Kaestner, Cemal Aydogan, Cemal Aydogan, Mahmut Bicer, Mahmut Bicer, B. Erdem Alaca, B. Erdem Alaca, Onur Ates, Onur Ates, Hamdi Torun, Hamdi Torun, Arda D. Yalcinkaya, Arda D. Yalcinkaya, Ahmad Ahmad, Ahmad Ahmad, Alexander Reum, Alexander Reum, Mathias Holz, Mathias Holz, } "Single nano-digit and closed-loop scanning probe lithography for manufacturing of electronic and optical nanodevices", Proc. SPIE 10456, Nanophotonics Australasia 2017, 1045621 (31 January 2018); doi: 10.1117/12.2282606; https://doi.org/10.1117/12.2282606
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