24 October 2017 Preliminary study of the influence of polarization orientation on bulk damage resistances of doubler KDP crystals
Author Affiliations +
Proceedings Volume 10457, AOPC 2017: Laser Components, Systems, and Applications; 104571E (2017) https://doi.org/10.1117/12.2284252
Event: Applied Optics and Photonics China (AOPC2017), 2017, Beijing, China
Abstract
The investigation of the influence polarization orientation on damage performance of type I doubler KDP crystals grown by the conventional growth method under under 532nm pulse exposure is carried out in this work. The obtained results point out the pinpoint density (ppd) of polarization parallels the extraordinary axis is around 1.5× less than that of polarization parallels the ordinary axis under the same fluence, although polarization has no influence on size distribution of pinpoints. Meanwhile, crystal inhomogeneity is observed during experiment.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
YinBo Zheng, YinBo Zheng, RongSheng Ba, RongSheng Ba, XinDa Zhou, XinDa Zhou, Jie Li, Jie Li, Jing Yuan, Jing Yuan, HongLei Xu, HongLei Xu, Jin Na, Jin Na, YaJun Li, YaJun Li, Lei Ding, Lei Ding, XiaoYu Yang, XiaoYu Yang, Liqun Chai, Liqun Chai, Bo Chen, Bo Chen, WanGuo Zheng, WanGuo Zheng, } "Preliminary study of the influence of polarization orientation on bulk damage resistances of doubler KDP crystals", Proc. SPIE 10457, AOPC 2017: Laser Components, Systems, and Applications, 104571E (24 October 2017); doi: 10.1117/12.2284252; https://doi.org/10.1117/12.2284252
PROCEEDINGS
6 PAGES


SHARE
Back to Top