24 October 2017 Preliminary study of the influence of polarization orientation on bulk damage resistances of doubler KDP crystals
Author Affiliations +
Proceedings Volume 10457, AOPC 2017: Laser Components, Systems, and Applications; 104571E (2017) https://doi.org/10.1117/12.2284252
Event: Applied Optics and Photonics China (AOPC2017), 2017, Beijing, China
Abstract
The investigation of the influence polarization orientation on damage performance of type I doubler KDP crystals grown by the conventional growth method under under 532nm pulse exposure is carried out in this work. The obtained results point out the pinpoint density (ppd) of polarization parallels the extraordinary axis is around 1.5× less than that of polarization parallels the ordinary axis under the same fluence, although polarization has no influence on size distribution of pinpoints. Meanwhile, crystal inhomogeneity is observed during experiment.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
YinBo Zheng, RongSheng Ba, XinDa Zhou, Jie Li, Jing Yuan, HongLei Xu, Jin Na, YaJun Li, Lei Ding, XiaoYu Yang, Liqun Chai, Bo Chen, WanGuo Zheng, "Preliminary study of the influence of polarization orientation on bulk damage resistances of doubler KDP crystals", Proc. SPIE 10457, AOPC 2017: Laser Components, Systems, and Applications, 104571E (24 October 2017); doi: 10.1117/12.2284252; https://doi.org/10.1117/12.2284252
PROCEEDINGS
6 PAGES


SHARE
Back to Top