Paper
24 October 2017 Effect of ridge structure on electro-optical characteristics of ridge-waveguide lasers with low vertical divergence based on photonic crystal structure
Shaoyu Zhao, Aiyi Qi, Hongwei Qu, Xuyan Zhou, Yuzhe Lin, Yufei Wang, Wanhua Zheng
Author Affiliations +
Proceedings Volume 10457, AOPC 2017: Laser Components, Systems, and Applications; 104572B (2017) https://doi.org/10.1117/12.2284797
Event: Applied Optics and Photonics China (AOPC2017), 2017, Beijing, China
Abstract
Ridge-waveguide (RW) lasers based on photonic crystal structure were fabricated and measured. We investigated the effect of residual layer thickness (corresponding to etching depth) and ridge width on electro-optical characteristics of RW lasers. For deep-etching RW lasers, although lateral beam quality factor M2 is better than that of shallow-etching RW lasers, the other characteristics such as output power are much less than that of shallow-etching RW lasers. The calculating results indicate that RW lasers with ridge width w ≥ 8 μm will operate in mixing mode. The experimentally results of various ridge width RW lasers show that RW laser with 7 μm ridge operated in single mode over the whole measurement range and RW laser with 8 μm ridge change from single-mode operation to mixing-mode operation with the increasing of driving current. The device with 7-μm-wide ridge and 3-mm-long cavity obtain 2 W single-transverse-mode optical power and 59% maximum power conversion efficiency. The lateral beam quality factors M2 values are less than 1.7 over the whole measuring range.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shaoyu Zhao, Aiyi Qi, Hongwei Qu, Xuyan Zhou, Yuzhe Lin, Yufei Wang, and Wanhua Zheng "Effect of ridge structure on electro-optical characteristics of ridge-waveguide lasers with low vertical divergence based on photonic crystal structure", Proc. SPIE 10457, AOPC 2017: Laser Components, Systems, and Applications, 104572B (24 October 2017); https://doi.org/10.1117/12.2284797
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KEYWORDS
Electro optics

Etching

Photonic crystals

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