24 October 2017 Calibration of polarization and adjustment error of high-NA spherical surface testing in point diffraction interferometry
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Proceedings Volume 10462, AOPC 2017: Optical Sensing and Imaging Technology and Applications; 1046207 (2017) https://doi.org/10.1117/12.2281494
Event: Applied Optics and Photonics China (AOPC2017), 2017, Beijing, China
Abstract
In order to achieve the precision of sub-nanometer and even higher of surface testing, this paper presents a highprecision point diffraction interferometric system for high-NA spherical surface testing. The point diffraction mask as a key component is designed and analyzed in detail. The circularly polarized light is used as the light source of interferometer system to calibrate the oblique-reflection wavefront aberration introduced by the point diffraction mask. Besides, the calibration of adjustment error is a critical issue in the test of high-numerical-aperture spherical surface, and it is hard to separate the high-order aberrations introduced by wavefront defocus from the mearsured data. We present a novel calibration method based on the Zernike aberration coefficients introduced by wavefront tilt and defocus. This novel method can be carried out without knowing the actual adjustment error amount and just needs the numerical aperture of testing wavefront to solve the high-order aberrations. With the proposed calibration method, the requirement for accuracy of the mechanism and experience of operator is lowered. Experiment shows the accuracy of calibrated system is better than 0.001λ rms, which can realize the high-precision testing.
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Yao Li, Yao Li, Yongying Yang, Yongying Yang, Chen Wang, Chen Wang, Yuankai Chen, Yuankai Chen, } "Calibration of polarization and adjustment error of high-NA spherical surface testing in point diffraction interferometry", Proc. SPIE 10462, AOPC 2017: Optical Sensing and Imaging Technology and Applications, 1046207 (24 October 2017); doi: 10.1117/12.2281494; https://doi.org/10.1117/12.2281494
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