High Index Of Refraction Films For Dielectric Mirrors Prepared By Metal-Organic Chemical Vapor Deposition

Raymond M. Brusasco

doi:10.1117/12.951349

11 July 1989 High Index Of Refraction Films For Dielectric Mirrors Prepared By Metal-Organic Chemical Vapor Deposition

Raymond M. Brusasco

Proceedings Volume 1047, Mirrors and Windows for High Power/High Energy Laser Systems; (1989) https://doi.org/10.1117/12.951349
Event: OE/LASE '89, 1989, Los Angeles, CA, United States

Abstract

A wide variety of metal oxides with high index of refraction can be prepared by Metal-Organic Chemical Vapor Deposition. We present some recent optical and laser damage results on oxide films prepared by MOCVD which could be used in a multilayer structure for highly reflecting (HR) dielectric mirror applications. The method of preparation affects both optical properties and laser damage threshold.

Citation Download Citation

Raymond M. Brusasco "High Index Of Refraction Films For Dielectric Mirrors Prepared By Metal-Organic Chemical Vapor Deposition", Proc. SPIE 1047, Mirrors and Windows for High Power/High Energy Laser Systems, (11 July 1989); https://doi.org/10.1117/12.951349

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