6 May 1989 General Approaches To Mask Design For Binary Optics
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Abstract
The fabrication of binary optics using high quality lithographic processes requires binary masks with constant phase contours. Parameter driven software for the development of these masks has been developed at Perkin-Elmer. Applications include zone plates, aspheric lenses, and optics described using Zernike polynomials, arbitrary phase functions, and sampled phase arrays.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James Logue, James Logue, Marilynn L. Chisholm, Marilynn L. Chisholm, } "General Approaches To Mask Design For Binary Optics", Proc. SPIE 1052, Holographic Optics: Optically and Computer Generated, (6 May 1989); doi: 10.1117/12.951482; https://doi.org/10.1117/12.951482
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