6 May 1989 Multiple Phase Level Computer-Generated Holograms Etched In Fused Silica
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Abstract
We present a new approach for fabricating multiple phase level holographic optical elements in fused silica. The approach utilizes electron-beam lithography, and it is particularly applicable for devices with minimum feature sizes below 1 μm. We have succeeded in fabricating arrays of multiple phase level optical elements with minimum features of 0.4 μm. We also report on the diffraction efficiencies of cylindrical f/1 lenses with 3 mm focal lengths. The results agree very well with the theoretical predictions. We also predict that an increase in diffraction efficiency of as much as 10 % can be realized from the outer portions of a holographic lens through better registration of the multiple layers.
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Kevin M. Flood, J. Michael Finlan, Richard J. Bojko, "Multiple Phase Level Computer-Generated Holograms Etched In Fused Silica", Proc. SPIE 1052, Holographic Optics: Optically and Computer Generated, (6 May 1989); doi: 10.1117/12.951491; https://doi.org/10.1117/12.951491
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