19 February 2018 Suppression of ablation by double-pulse femtosecond laser irradiation
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Abstract
We have demonstrated the suppression of ablation rate on a silicon surface irradiated by a double-pulse beam with two color laser in time delays of Δt = -900 - 900 ps. The double pulse beam consists of 810nm with 40fs pulse and 405nm with > 40fs pulse. The fundamental-pulse fluence F810 is kept below ablation threshold (Fth, 810nm = 0.190 J/cm2 ) while the second harmonic pulse fluence F405 are kept above the ablation threshold (Fth, 405nm = 0.050 J/cm2 ). We find that ablation rate of silicon is drastically decreased at delay times of 600ps.
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Masaki Hashida, Shinichiro Masuno, Yuki Furukawa, Shogo Nishino, Mitsuhiro Kusaba, Shunsuke Inoue, Shuji Sakabe, Hitoshi Sakagami, Masahiro Tsukamoto, "Suppression of ablation by double-pulse femtosecond laser irradiation", Proc. SPIE 10522, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XVIII, 105220S (19 February 2018); doi: 10.1117/12.2291229; https://doi.org/10.1117/12.2291229
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