19 February 2018 Suppression of ablation by double-pulse femtosecond laser irradiation
Author Affiliations +
We have demonstrated the suppression of ablation rate on a silicon surface irradiated by a double-pulse beam with two color laser in time delays of Δt = -900 - 900 ps. The double pulse beam consists of 810nm with 40fs pulse and 405nm with > 40fs pulse. The fundamental-pulse fluence F810 is kept below ablation threshold (Fth, 810nm = 0.190 J/cm2 ) while the second harmonic pulse fluence F405 are kept above the ablation threshold (Fth, 405nm = 0.050 J/cm2 ). We find that ablation rate of silicon is drastically decreased at delay times of 600ps.
Conference Presentation
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Masaki Hashida, Masaki Hashida, Shinichiro Masuno, Shinichiro Masuno, Yuki Furukawa, Yuki Furukawa, Shogo Nishino, Shogo Nishino, Mitsuhiro Kusaba, Mitsuhiro Kusaba, Shunsuke Inoue, Shunsuke Inoue, Shuji Sakabe, Shuji Sakabe, Hitoshi Sakagami, Hitoshi Sakagami, Masahiro Tsukamoto, Masahiro Tsukamoto, } "Suppression of ablation by double-pulse femtosecond laser irradiation", Proc. SPIE 10522, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XVIII, 105220S (19 February 2018); doi: 10.1117/12.2291229; https://doi.org/10.1117/12.2291229

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