19 February 2018 Enhanced ablation with a femtosecond-nanosecond dual-pulse
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Abstract
Single-shot ablation of GaAs samples by a collinear femtosecond-nanosecond (fs-ns) dual-pulse is investigated. Significantly enhanced material removal is achieved by optimally combining a single 8 ns pulse at 1064 nm and a single 50 fs pulse at 800 nm in time. The resulting ablation craters are examined for inter-pulse delays ranging from -50 ns (ns first) to +1 μs (fs first) as well as very long delays of ±30 s. Crater profilometry is conducted with white light interferometry and optical microscopy to determine the volume of ablated material and identify surface features that reveal information about the physical mechanism of material removal during fs-ns dual-pulse ablation.
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Haley Kerrigan, Haley Kerrigan, Shermineh Rostami Fairchild, Shermineh Rostami Fairchild, Martin Richardson, Martin Richardson, } "Enhanced ablation with a femtosecond-nanosecond dual-pulse", Proc. SPIE 10522, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XVIII, 105221I (19 February 2018); doi: 10.1117/12.2290062; https://doi.org/10.1117/12.2290062
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