Paper
22 February 2018 A new method for electrode deposition using a SU-8 shadow mask in a 3D electro-wetting lenticular lens chamber structure
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Abstract
There are various methods of patterning electrodes in a MEMS process. However, it is difficult to pattern electrodes in a 3-dimensional structure. One way to overcome these drawbacks is to use a shadow mask. This approach allows electrodes to be deposited on selected areas even if the substrate is not flat. In this paper, a SU-8 shadow mask that is inexpensive and easy to fabricate is proposed. Another advantage of the SU-8 shadow mask is reusability. Most importantly, it is possible to deposit a microscale electrode on 3-dimensional structure with the SU-8 shadow mask. Here, the electrode was deposited on the chamber of an electro-wetting lenticular lens. The chamber structure of the electrowetting lenticular lens has a long reversed trapezoidal shape. In order to adjust the optical axis in the electro-wetting lenticular lens, electrodes should be deposited on each sidewall of the chamber. It was verified that the electrodes were successfully separated with use of the SU-8 shadow mask and the width of the electrode was 50μm.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dooseub Shin, Gyo Hyun Koo, and Yong Hyub Won "A new method for electrode deposition using a SU-8 shadow mask in a 3D electro-wetting lenticular lens chamber structure", Proc. SPIE 10544, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XI, 105441G (22 February 2018); https://doi.org/10.1117/12.2289190
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KEYWORDS
Electrodes

Photomasks

Lenticular lenses

Silicon

Semiconducting wafers

Liquids

Lithography

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