15 August 1989 UV Surface Photochemistry And Hot Electron Transfer
Author Affiliations +
Proceedings Volume 1056, Photochemistry in Thin Films; (1989) https://doi.org/10.1117/12.951628
Event: OE/LASE '89, 1989, Los Angeles, CA, United States
Two different photolytic mechanisms were identified for CH3C1 on Ni(111). Direct photolysis and electron-induced fragmentation was observed in time of flight (TOF) studies using 193 nm radiation. At 248 nm only the electron induced channel was observed. Both mechanisms were strongly inhibited in the first 2 monolayers, due to electron transfer occurring on a 1 to 5 femtosecond time scale. The electron induced process was surface specific, occurring within a limited adsorbate thickness determined by the penetration depth of the excited substrate electrons into the adsorbate. Cross sections for the total photolytic removal of parent molecules are reported as a function of coverage.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James P Cowin, James P Cowin, Eugene P Marsh, Eugene P Marsh, Wolfgang Meier, Wolfgang Meier, Terry L. Gilton, Terry L. Gilton, Mark R. Schneider, Mark R. Schneider, "UV Surface Photochemistry And Hot Electron Transfer", Proc. SPIE 1056, Photochemistry in Thin Films, (15 August 1989); doi: 10.1117/12.951628; https://doi.org/10.1117/12.951628

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