8 May 2018 Front Matter: Volume 10583
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 10583, including the Title Page, Copyright information, Table of Contents, and Conference Committee listing.

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Author(s), “Title of Paper,” in Extreme Ultraviolet (EUV) Lithography IX, edited by Kenneth A. Goldberg, Proceedings of SPIE Vol. 10583 (SPIE, Bellingham, WA, 2018) Seven-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510616585

ISBN: 9781510616592 (electronic)

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Authors

Numbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

Abe, Tamotsu, 18, 28

Adelmann, Christoph, 1E

Ahn, Chang-Nam, 0X, 0Y

Akiteru, Ko, 0E

Argitis, Panagiotis, 1R

Arnold, John, 0E

Bai, Kunlun, 0K

Bailey, Todd, 0N, 1N

Baljozovic, Milos, 0A

Ban, Chung-Hyun, 22

Bauer, Markus, 12

Bäumer, Stefan, 0S

Bekaert, Joost, 0I, 0L, 0U

Bekman, Herman, 10

Béral, Christophe, 0I, 0U

Biafore, John J., 0K, 1N

Biesemans, Serge, 0L, 1M

Blanco Carballo, Victor, 0G, 0L, 0U

Blankenship, David, 0K

Bömmels, Jürgen, 0U

Bouten, Sander, 0I

Brendler, Andrew C., 0C

Briggs, Basoene, 0U

Briggs, Benjamin, 0E

Broman, Pär, 0Y

Brunner, Timothy A., 0C, 0I, 0J

Cabrera, Yasiel, 09

Capelli, Renzo, 0J, 11

Carcasi, Michael, 1M

Castellanos, Sonia, 0A

Chabal, Yves J., 09

Chen, Xuemei, 0C, 0D, 0J

Chen, Yulu, 0D

Chesneau, A., 13

Cho, Maenghyo, 23

Choi, HeungSoo, 0E

Choi, Joonmyung, 23

Chowdhury, Yassin, 0S

Chunder, Anindarupa, 1N

Ciofi, Ivan, 0U

Civay, D., 13

Clifford, Chris, 0P

Corliss, Dan, 0F

Cornell, Roger, 0Z

Culp, James A., 0C

Custers, Rolf, 1W

Dawson, Guy, 08, 1L

Debacker, Peter, 26

De Bisschop, Peter, 0G, 0I, 0K, 0U, 1K

Decoster, Stefan, 0U

De Gendt, Stefan, 07

Dei, Satoshi, 1M

de Klerk, Jos, 0H

Demand, Marc, 0L, 1V

De Poortere, E., 0L

De Silva, Anuja, 0E, 0V

De Simone, Danilo, 07, 08, 0G, 1M

Deutz, Alex, 10

Dietzel, Martin, 0J, 11

Dikkers, Manfred, 0S

Drissi, Y., 0L

Dusa, M., 0L

Dutta, Ashim, 0V

Ekinci, Yasin, 0A, 1H, 1I, 1L, 1R, 1W

El-Mekki, Zaid, 0U

Engelen, Wouter, 0S

Enomoto, Masashi, 1V

Erdmann, Andreas, 12

Ervin, Joseph, 0W

Evanschitzky, Peter, 12

Fan, Shuhai, 0Z

Feigl, Torsten, 0S

Felix, Nelson M., 0E, 0V

Fenger, Germain, 0P, 0Q

Fernandez, Sara, 1H, 1I

Finders, Jo, 0Y

Fisser, Geert, 0H

Foubert, Philippe, 1M, 1V

Franke, Joern-Holger, 0L, 0W

Fühner, Tim, 14

Fumar-Pici, Anita, 0X

Gabor, Allen H., 0C, 0D

Gallagher, Emily, 1E

Gao, Weimin, 0O, 14, 1S

Garlick, Jon, 1C

Garrido Olvera, Karen, 1W

Ghosh, Subrata, 1Q

Giannelis, Emmanuel P., 06, 1P, 1U

Gillijns, W., 0L

Gonsalves, Kenneth E., 1Q

Goodwin, Francis, 0D

Graves, Trey, 0K

Guo, Jing, 0V

Guo, Vivian Wei, 0N

Halder, Sandip, 0W

Hamed Fatehy, Ahmed, 1X, 21

Hamieh, Bassem, 0E

Harada, Tetsuo, 20

Hashimoto, Yusaku, 0E, 1V

Hassanein, Ahmed, 19

Hayashi, Hideyuki, 28

Helfenstein, Patrick, 1H, 1I

Hellweg, Dirk, 0J, 11

Hendrickx, Eric, 0I, 0L, 0O, 0P, 0U, 12, 1K

Hetzer, Dave, 0E

Heylen, Nancy, 0U

Hoefnagels, Rik, 1W

Hontake, Koichi, 0E

Hoppe, Wolfgang, 0O

Hori, Masafumi, 1M

Hori, Tsukasa, 18, 28

Hsu, S., 0L

Huli, Lior, 0E

Hutcheson, G. Dan, 03

Huyghebaert, Cedric, 1E

Hyun, Yoonsuk, 0Y

Ichinomiya, Hiroshi, 0E, 1V

Ide, Hiroyuki, 1M

Ishii, Takuya, 28

Isono, Mariko, 20

Isoyan, Artak, 1S

Itou, Noritoshi, 28

Jain, Ankit, 0E

Jayaram, Srividya, 0N

Jeong, Changyoung, 23

Jia, J., 0L

Jiang, Fan, 0N, 0P, 1X

Jiang, Jing, 07

Jin, Chunshui, 1T

Johnson, Kenneth C., 19

Johnson, Rick, 0F

Jonckheere, Rik, 1F

Jourdan, Nicolas, 0U

Juncker, Aurelie, 0W

Jung, Thomas, 0A

Kai, Akiko, 0E

Kamei, Yuya, 1M, 1V

Kamo, Takashi, 1F

Kandel, Yudhishthir, 14, 1S

Kang, Junghyun, 0Y

Kapteyn, Henry, 1C

Kasahara, Kazuki, 1P, 1U

Kawakami, Shinichiro, 0E, 1V

Kawasuji, Yasufumi, 18, 28

Kazazis, Dimitrios, 0A, 1H, 1I, 1L, 1R

Kesters, Els, 0U

Kersteen, Grizelda, 0J, 11

Kim, Heebom, 23

Kim, Hwan, 0Y

Kim, Muyoung, 23

Kim, Ryoung-han, 0L, 0O, 0U, 26

Kling, Michael, 0D

Koch, Markus, 11

Kodama, Takeshi, 18, 28

Kondo, Yoshihiro, 1M

Kosma, Vasiliki, 06, 1P, 1U

Kotb Ali, Rehab, 1X, 21

Koufakis, Eleftherios, 1R

Kozawa, Takahiro, 07

Kriese, Michael, 0S

Kupers, Michiel, 0I, 0L

Kutrzeba Kotowska, Bogumila, 0U

Lafferty, Neal, 0Q, 1X, 21

Laffosse, E., 13

Larivière, Stéphane, 0U

Latypov, Azat, 1N

Laubis, Christian, 1E

Lazzarino, Frederic, 0W

Lee, Byunghoon, 23

Lee, Inhwan, 0Y

Lee, Jae Uk, 1E

Lee, Sung-Gyu, 22

Lemley, Corey, 0E

Lenox, Chet, 0E

Levasier, Leon, 0H

Levinson, Harry J., 0C, 1N

Li, Chun, 1T

Li, Hailiang, 1T

Li, Wenxin, 0Z

Liebmann, Lars, 0D

Lim, Chang-Moon, 0X, 0Y

Lim, Mijung, 0X

Limpens, Maurice P. M. A., 10

Liu, Eric, 0E

Liu, Yu, 1T

Liubich, Vlad, 0P

Lorusso, Gian, 0G

Lucas, Kevin, 0O

Luo, Feixiang, 0D

Mallik, Arindam, 0U, 26

Manouras, Theodoros, 1R

Mansfield, Scott, 0N, 0Z

Mao, Ming, 0L, 0U

Mariano, Marina, 1E

Maruyama, Ken, 1M

Matham, Shravan, 0E

Matsumoto, Yoko, 20

Mattson, Eric C., 09

McClelland, Alexandra, 08, 1L

McIntyre, Greg, 0L, 0U, 26

McNamara, John, 0Y

Meeuwissen, Marieke, 1W

Meiling, Hans, 0H

Meli, Luciana, 0E, 0F, 0V

Melvin, Lawrence S., III, 0O, 14, 1S

Mesilhy, Hazem, 12

Mignot, Yann, 0E, 0V

Mikami, Shinji, 0B

Minekawa, Yukie, 1M

Minnaert, Arthur, 0H

Miyake, Masayuki, 1M

Miyao, Kenichi, 28

Mizoguchi, Hakaru, 18, 28

Mochi, Iacopo, 1H, 1I, 1W

Mocuta, Dan, 0U

Moinuddin, Mohamad Ghulam, 1Q

Moon, Junghwan, 23

Moors, Roel, 0H

Moriya, Teruhiko, 1M

Mountfort, Eric, 1C

Murdoch, Gayle, 0W

Nafus, Kathleen, 0L, 1M, 1V

Nagahara, Seiji, 1M

Nagai, Tomoki, 1M

Naito, Michiya, 20

Nakagawa, Hisashi, 1M

Nakajima, Makoto, 0M

Nakarai, Hiroaki, 18, 28

Nakashima, Hideo, 1M

Naruoka, Takehiko, 1M

Naulleau, Patrick, 1G

Neureuther, Andrew, 1G

Nowak, Krzysztof M., 18

Ober, Christopher K., 06, 1P, 1U

Oh, Hye-Keun, 22

Okamoto, Takeshi, 28

Oliver, John, 1D

Oshima, Akihiro, 1M

Park, Daniel, 0X

Park, Eun-Sang, 22

Park, Jae-Hun, 22

Peeters, Rudy, 0H

Petersen, John S., 1M

Petrillo, Karen, 0E

Philipsen, Vicky, 0O, 12

Pieters, Marco, 0H

Pollentier, Ivan, 1E

Popescu, Carmen, 08, 1L

Portale, Giuseppe, 0A

Pradeep, Chullikkattil P., 1Q

Raghunathan, Ananthan, 0Q

Rajeev, Rajendran, 1H, 1I

Reddy, Pulikanti Guruprasad, 1Q

Rio, D., 0L

Rispens, Gijsbert, 0Y, 1W

Robertson, Stewart, 0K

Robinson, Alex P. G., 08, 1L

Robinson, Chris, 0E, 0F

Ronse, Kurt, 0U, 26

Roth, John, 08, 1L

Rupich, Sara M., 09

Rutigliani, Vito, 0G

Saitou, Takashi, 18, 28

Sakai, Kazunori, 06, 1P, 1U

Sakamoto, Rikimaru, 0M

Saville, Barry, 0E

Schasfoort, Ad, 0S

Schiffelers, Guido, 0I, 0L

Schmidt, Daniel, 0D

Scholze, Frank, 1E

Sekiguchi, Atsushi, 20

Seong, Nak, 0X

Shang, Shumay, 0Q

Sharma, Satinder K., 1Q

Shearer, Jeffrey, 0E

Sherwin, Stuart, 1G

Shibayama, Wataru, 0M

Shigaki, Shuhei, 0M

Shima, Motoyuki, 1M

Shimada, Ryo, 1M

Shimoaoki, Takeshi, 0E

Shiobara, Eishi, 0B

Shiozawa, Takahiro, 1V

Shiraishi, Gosuke, 1M

Shiraishi, Yutaka, 18, 28

Shite, Hideo, 1V

Sizyuk, Tatyana, 19, 1D

Sizyuk, Valeryi, 19

Smits, Joost, 0H

Sonoda, Akihiro, 1V

Soumangne, George, 18

Storm, Arnold J., 10

Sturtevant, John, 0Q

Sun, Lei, 0D

Sun, Yuyang, 0N

Tagawa, Seiichi, 1M

Takeda, Satoshi, 0M

Takeshita, Kazuhiro, 1M

Tamura, Mamoru, 0M

Tan, L. E., 0L

Tanaka, Hiroshi, 18

Tanaka, Koichiro, 0E

Tasdemir, Zuhal, 1W

te Sligte, Edwin, 10

Theis, Wolfgang, 08, 1L

Timmermans, Marina Y., 1E

Tokei, Zsolt, 0U

Tomono, Masaru, 1M

Tritchkov, Alexander, 0N

Ueno, Yoshifumi, 28

Utsumi, Yoshiyuki, 20

Vaglio Pret, Alessandro, 0K

Vamvakaki, Maria, 1R

van de Kerkhof, Mark A., 0H, 0I, 0S

Vandenberghe, Geert, 07, 08, 0G, 1M

Van den Heuvel, Dieter, 0U

van der Veen, Marleen H., 0U

van Es, Roderik, 0H

van Putten, Michel, 10

van Veldhoven, Jacqueline, 10

Verdonck, Patrick, 0U

Verduijn, Erik, 0I, 0J

Verhoeven, Eric, 0H

Versluijs, Janko, 0U

Vesters, Yannick, 07, 08, 0G

Vincent, Benjamin, 0W

Viswanathan, Ramya, 0Z

Vockenhuber, Michaela, 0A, 1W

Voogd, Robbert Jan, 0S

Wan, Danny, 0U

Wang, Hui, 1T

Wang, Liping, 1T

Wang, Ziyang, 0Y

Watanabe, Takeo, 20

Watanabe, Yukio, 18, 28

Westerhuis, Evert, 0S

Wiaux, Vincent, 0O, 0P

Wilson, Christopher J., 0U

Wolke, Conrad, 11

Wood, Obert, 0D, 0J

Word, James, 1X, 21

Wu, Chien-Ching, 10

Wu, Lianjia, 0A

Xie, Changqing, 1T

Xie, Yao, 1T

Xu, Hong, 06, 1P, 1U

Yamada, Kenji, 0B

Yamada, Tsuyoshi, 18

Yamamoto, Hiroki, 07

Yamane, Takeshi, 1F

Yamazaki, Taku, 18, 28

Yan, Qiliang, 1S

Yanagida, Tatsuya, 18, 28

Yang, Kou, 1P

Yao, Shun, 1T

Yao, Yiping, 0V

Yildirim, Oktay, 1W

Yin, Lianghong, 0Q

Yoshihara, Kosuke, 1M

Yoshitake, S., 1H

Yu, Bo, 1T

Yu, Jie, 1T

Yuan, Weirong, 1D

Zeitner, Uwe, 0S

Zhang, Haitao, 1T

Zhang, Hongxin, 0Z

Zhang, Xiaoshi, 1C

Zhang, Xima, 0N

Zhao, Shuo, 0D

Zhuang, Larry, 0N

Conference Committee

Symposium Chair

  • Bruce W. Smith, Rochester Institute of Technology (United States)

Symposium Co-chair

  • Will Conley, Cymer, An ASML company (United States)

Conference Chair

  • Kenneth A. Goldberg, Lawrence Berkeley National Laboratory (United States)

Conference Co-chair

  • Nelson M. Felix, IBM Corporation (United States)

Conference Program Committee

  • Markus Bender, Advanced Mask Technology Center GmbH Company KG (Germany)

  • Jos P. Benschop, ASML Netherlands B.V. (Netherlands)

  • Robert L. Brainard, SUNY CNSE/SUNYIT (United States)

  • Martin Burkhardt, IBM Thomas J. Watson Research Center (United States)

  • Deniz Elizabeth Civay, GLOBALFOUNDRIES Inc. (United States)

  • Daniel Corliss, IBM Corporation (United States)

  • Yasin Ekinci, Paul Scherrer Institut (Switzerland)

  • Allen H. Gabor, GLOBALFOUNDRIES Inc. (United States)

  • Emily E. Gallagher, IMEC (Belgium)

  • Florian Gstrein, Intel Corporation (United States)

  • Naoya Hayashi, Dai Nippon Printing Company, Ltd. (Japan)

  • Eric Hendrickx, IMEC (Belgium)

  • Soichi Inoue, Toshiba Corporation (Japan)

  • Bryan S. Kasprowicz, Photronics, Inc. (United States)

  • Insung Kim, SAMSUNG Electronics Company, Ltd. (Korea, Republic of)

  • Seong-Sue Kim, SAMSUNG Electronics Company, Ltd. (Korea, Republic of)

  • Ted Liang, Intel Corporation (United States)

  • Chang-Moon Lim, SK Hynix, Inc. (Korea, Republic of)

  • Anna Lio, Intel Corporation (United States)

  • Lawrence S. Melvin III, Synopsys, Inc. (United States)

  • Hiroaki Morimoto, Toppan Printing Company, Ltd. (Japan)

  • Patrick P. Naulleau, Lawrence Berkeley National Laboratory (United States)

  • Christopher S. Ngai, Applied Materials, Inc. (United States)

  • Shinji Okazaki, Gigaphoton Inc. (Japan)

  • Eric M. Panning, Intel Corporation (United States)

  • Jan Hendrik Peters, bmbg consult (Germany)

  • Moshe E. Preil, KLA-Tencor Corporation (United States)

  • Kurt G. Ronse, IMEC (Belgium)

  • Tsutomu Shoki, HOYA Corporation (Japan)

  • Akiyoshi Suzuki, Gigaphoton Inc. (Japan)

  • Anna Tchikoulaeva, Lasertec U.S.A., Inc. Zweigniederlassung Deutschland (Germany)

  • Thomas I. Wallow, ASML Brion (United States)

  • Obert R. Wood II, GLOBALFOUNDRIES Inc. (United States)

Session Chairs

  • Keynote Session

    Kenneth A. Goldberg, Lawrence Berkeley National Laboratory (United States)

    Nelson M. Felix, IBM Corporation (United States)

  • EUV: Resist Processes: Joint session with conferences 10583 and 10586

    Thomas I. Wallow, ASML Brion (United States)

    James W. Thackeray, Dow Electronic Materials (United States)

  • EUV: Metal-based Resists: Joint session with conferences 10583 and 10586

    Jason K. Stowers, Inpria Corporation (United States)

    Christopher S. Ngai, Applied Materials, Inc. (United States)

  • EUV Patterning I

    Soichi Inoue, Toshiba Corporation (Japan)

    Bryan S. Kasprowicz, Photronics, Inc. (United States)

  • EUV Patterning II

    Yoonsuk Hyun, SK Hynix, Inc. (Korea, Republic of)

    Moshe E. Preil, KLA-Tencor Corporation (United States)

  • RET I

    Emily E. Gallagher, IMEC (Belgium)

    Patrick P. Naulleau, Lawrence Berkeley National Laboratory (United States)

  • EUV Optics

    Jos P. Benschop, ASML Netherlands B.V. (Netherlands)

  • Speed Talks Poster Previews

    Kenneth A. Goldberg, Lawrence Berkeley National Laboratory (United States)

    Nelson M. Felix, IBM Corporation (United States)

  • Patterning and Etch for EUV: Joint session with conferences 10583 And 10589

    Seong-Sue Kim, SAMSUNG Electronics Company, Ltd. (Korea, Republic of)

    Richard S. Wise, Lam Research Corporation (United States)

  • RET II

    Daniel A. Corliss, IBM Corporation (United States)

    Martin Burkhardt, IBM Thomas J. Watson Research Center (United States)

  • EUV Mask

    Ted Liang, Intel Corporation (United States)

    Emily E. Gallagher, IMEC (Belgium)

  • Special Session: Three Points on Shot Noise, 100 Years Later

    Kenneth A. Goldberg, Lawrence Berkeley National Laboratory (United States)

    Nelson M. Felix, IBM Corporation (United States)

  • EUV Source

    Akiyoshi Suzuki, Gigaphoton Inc. (Japan)

    Kurt G. Ronse, IMEC (Belgium)

  • EUV Mask Defectivity

    Naoya Hayashi, Dai Nippon Printing Company, Ltd. (Japan)

    Yasin Ekinci, Paul Scherrer Institut (Switzerland)

  • EUV Resist Roughness

    Allen H. Gabor, GLOBALFOUNDRIES Inc. (United States)

    Anna Lio, Intel Corporation (United States)

  • Novel EUV Resist Concepts

    Robert L. Brainard, SUNY CNSE/SUNYIT (United States)

    Florian Gstrein, Intel Corporation (United States)

© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 10583", Proc. SPIE 10583, Extreme Ultraviolet (EUV) Lithography IX, 1058301 (8 May 2018); doi: 10.1117/12.2325181; https://doi.org/10.1117/12.2325181
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