EUV for HVM: towards an industrialized scanner for HVM NXE3400B performance update

Roderik van Es; Mark van de Kerkhof; Arthur Minnaert; Geert Fisser; Jos de Klerk; Joost Smits; Roel Moors; Eric Verhoeven; Leon Levasier; Rudy Peeters; Marco Pieters; Hans Meiling

doi:10.1117/12.2299503

19 March 2018 EUV for HVM: towards an industrialized scanner for HVM NXE3400B performance update

Roderik van Es, Mark van de Kerkhof, Arthur Minnaert, Geert Fisser, Jos de Klerk, Joost Smits, Roel Moors, Eric Verhoeven, Leon Levasier, Rudy Peeters, Marco Pieters, Hans Meiling

Author Affiliations +

Proceedings Volume 10583, Extreme Ultraviolet (EUV) Lithography IX; 105830H (2018) https://doi.org/10.1117/12.2299503
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

With the introduction of its fifth-generation NXE:3400B scanner, ASML brought EUV to High- Volume Manufacturing for 7 nm node lithography and beyond with full support of pellicle. This paper presents an update on lithographic performance results obtained with the NXE:3400B, characterized by an NA of 0.33, a Pupil Fill Ratio (PFR) of 0.2 and throughput capability of 125 wafers per hour. Advances in source power and system availability have enabled a continued increase of productivity. To maximize the number of yielding dies per day excellent Overlay, Focus, and Critical Dimension (CD) control have been realized, combining intrinsic tool stability with holistic control schemes. We will also show matching performance for both Overlay and Imaging, and further improvements in Focus Process Dependencies for the 5nm node.

Conference Presentation

Citation Download Citation

Roderik van Es, Mark van de Kerkhof, Arthur Minnaert, Geert Fisser, Jos de Klerk, Joost Smits, Roel Moors, Eric Verhoeven, Leon Levasier, Rudy Peeters, Marco Pieters, and Hans Meiling "EUV for HVM: towards an industrialized scanner for HVM NXE3400B performance update", Proc. SPIE 10583, Extreme Ultraviolet (EUV) Lithography IX, 105830H (19 March 2018); https://doi.org/10.1117/12.2299503

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available