The future of EUV lithography: continuing Moore's Law into the next decade

Jan van Schoot; Kars Troost; Frank Bornebroek; Rob van Ballegoij; Sjoerd Lok; Peter Krabbendam; Judon Stoeldraijer; Jos Benschop; Jo Finders; Hans Meiling; Eelco van Setten; Bernhard Kneer; Peter Kuerz; Winfried Kaiser; Tilmann Heil; Sascha Migura

doi:10.1117/12.2295800

19 March 2018 The future of EUV lithography: continuing Moore's Law into the next decade

Jan van Schoot, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Peter Krabbendam, Judon Stoeldraijer, Jos Benschop, Jo Finders, Hans Meiling, Eelco van Setten, Bernhard Kneer, Peter Kuerz, Winfried Kaiser, Tilmann Heil, Sascha Migura

Author Affiliations +

Proceedings Volume 10583, Extreme Ultraviolet (EUV) Lithography IX; 105830R (2018) https://doi.org/10.1117/12.2295800
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

While 0.33NA EUV systems are readying to start volume manufacturing, ASML and Zeiss are ramping up development activities on a 0.55NA EUV exposure tool, extending Moore’s law throughout the next decade. A novel, anamorphic lens design, has been developed to provide the NA; this lens will be paired with new, faster stages and more accurate sensors and the tight focus and overlay control needed for future process nodes. This paper presents an overview of the target specifications, key technology innovations and imaging simulations demonstrating the advantages as compared to 0.33NA and showing the capabilities of ASML’s next generation EUV systems.

Conference Presentation

Citation Download Citation

Jan van Schoot, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Peter Krabbendam, Judon Stoeldraijer, Jos Benschop, Jo Finders, Hans Meiling, Eelco van Setten, Bernhard Kneer, Peter Kuerz, Winfried Kaiser, Tilmann Heil, and Sascha Migura "The future of EUV lithography: continuing Moore's Law into the next decade", Proc. SPIE 10583, Extreme Ultraviolet (EUV) Lithography IX, 105830R (19 March 2018); https://doi.org/10.1117/12.2295800

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available