EUV mask lifetime testing using EBL2

Chien-Ching Wu; Edwin te Sligte; Herman Bekman; Arnold J. Storm; Michel van Putten; Maurice P.M. A. Limpens; Jacqueline van Veldhoven; Alex Deutz

doi:10.1117/12.2297369

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19 March 2018 EUV mask lifetime testing using EBL2

Chien-Ching Wu, Edwin te Sligte, Herman Bekman, Arnold J. Storm, Michel van Putten, Maurice P.M. A. Limpens, Jacqueline van Veldhoven, Alex Deutz

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Proceedings Volume 10583, Extreme Ultraviolet (EUV) Lithography IX; 1058310 (2018) https://doi.org/10.1117/12.2297369
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

EBL2 is TNO's platform for EUV exposure testing and surface analysis. EBL2 is capable of generating conditions relevant to EUV mask operation at all foreseen source power nodes. The authors describe how TNO performs a customized (accelerated) lifetime test on EUV masks. The required gas, EUV, and thermal parameters will be considered, and related to simulated and measured performance of EBL2. This approach can also be applied to EUV pellicles and optics.

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Chien-Ching Wu, Edwin te Sligte, Herman Bekman, Arnold J. Storm, Michel van Putten, Maurice P.M. A. Limpens, Jacqueline van Veldhoven, and Alex Deutz "EUV mask lifetime testing using EBL2", Proc. SPIE 10583, Extreme Ultraviolet (EUV) Lithography IX, 1058310 (19 March 2018); https://doi.org/10.1117/12.2297369

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